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In situ spectroscopic ellipsometry for the real time process control of plasma etching of silicon nitride

著者名:
掲載資料名:
Nondestructive methods for materials characterization : symposium held November 29-30, 1999, Boston, Massachusetts, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
591
発行年:
2000
開始ページ:
263
出版情報:
Warrendale, Pa.: MRS-Materials Research Society
ISSN:
02729172
ISBN:
9781558994997 [1558994998]
言語:
英語
請求記号:
M23500/591
資料種別:
国際会議録

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