Blank Cover Image

Controlled Incorporation of Nitrogen at the Top Surface of Silicon Oxide Gate Dielectrics

著者名:
掲載資料名:
Amorphous and crystalline insulating thin films--1996 : symposium held December 2-4, 1996, Boston, Massachusetts, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
446
発行年:
1997
開始ページ:
103
出版情報:
Pittsburgh, Pa.: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558993501 [1558993509]
言語:
英語
請求記号:
M23500/446
資料種別:
国際会議録

類似資料:

Koh, K., Niimi, H., Lucovsky, G.

Electrochemical Society

Hattangady, S. V., Niimi, H., Gandhi, S., Lucovsky, G.

MRS - Materials Research Society

Koh, K., Niimi, H., Lucovsky, G.

MRS - Materials Research Society

Lucovsky, G., Niimi, H., Koh, K., Lee, D.R., Jing, Z.

Electrochemical Society

Niimi, H., Koh, K., Lucovsky, G.

Electrochemical Society

Lucovsky, G.

MRS - Materials Research Society

Yang, H., Niimi, H., Wu, Y., Lucovsky, G.

MRS - Materials Research Society

Ma, Y., Hattangady, S. V., Yasuda, T., Niimi, H., Gandhi, S., Lucovsky, G.

MRS - Materials Research Society

Brillson, L. J., Young, A. P., Schafer, J., Niimi, H., Lucovsky, G.

MRS - Materials Research Society

Lucovsky, G., Nimi, H., Koh, K.

MRS - Materials Research Society

Lucovsky, Gerry, Wu, Yider, Lee, Yi-Mu, Yang, Hanyang, Niimi, Hiro

MRS-Materials Research Society

1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12