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Bonding of Hydrogen and Deuterium in Silicon Nitride Films Prepared by Remote Plasma Enhanced Chemical Vapor Deposition

著者名:
掲載資料名:
Amorphous silicon technology, 1995 : Symposium held April 18-21, 1995, San Francisco, California, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
377
発行年:
1995
開始ページ:
313
出版情報:
Pittsburgh, Pa.: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558992801 [1558992804]
言語:
英語
請求記号:
M23500/377
資料種別:
国際会議録

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