Modeling of Ion Implantation and Diffusion in Si
- 著者名:
- 掲載資料名:
- Materials science applications of ion beam techniques : proceedings of the International Symposium on Materials Science Applications of Ion Beam Techniques, incoeporating the 1st German-Australian Workshop on Ion Beam Analysis, Seeheim, Germany, September 9-12 1996
- シリーズ名:
- Materials science forum
- シリーズ巻号:
- 248-249
- 発行年:
- 1997
- 開始ページ:
- 41
- 終了ページ:
- 48
- 出版情報:
- Zuerich, Switzerland: Trans Tech Publications
- ISSN:
- 02555476
- ISBN:
- 9780878497676 [0878497676]
- 言語:
- 英語
- 請求記号:
- M23650
- 資料種別:
- 国際会議録
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12
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Annealing Kinetics of Single Displacement Cascades in Ni: An Atomic Scale Computer Simulation
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