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Fabrication of microrelief surfaces using a one-step lithography process (Invited Paper)

著者名:
Reimer,K. ( Fraunhofer Institut fur Siliziumtechnologie (FRG) )
Hofmann,U. ( Fraunhofer Institut fur Siliziumtechnologie (FRG) )
Jurss,M. ( Fraunhofer Institut fur Siliziumtechnologie (FRG) )
Pulz,W. ( Fraunhofer Institut fur Siliziumtechnologie (FRG) )
Quenzer,H.J. ( Fraunhofer Institut fur Siliziumtechnologie (FRG) )
Wagner,B. ( Fraunhofer Institut fur Siliziumtechnologie (FRG) )
さらに 1 件
掲載資料名:
Microelectronic Structures and MEMS for Optical Processing III
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
3226
発行年:
1997
開始ページ:
2
終了ページ:
10
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819426581 [081942658X]
言語:
英語
請求記号:
P63600/3226
資料種別:
国際会議録

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