Three-dimensional electron-beam lithography simulator V2.O for the gigabit-era photomask manufacturing
- 著者名:
Kim.Y.-H ( Samsung Electronics Co.,Ltd. (Korea) ) Cha.B.-C ( Samsung Electronics Co.,Ltd. (Korea) ) Lee,H.-J. ( Samsung Electronics Co.,Ltd. (Korea) ) Sohn,J.-M. ( Samsung Electronics Co.,Ltd. (Korea) ) Kong,J.-T. ( Samsung Electronics Co.,Ltd. (Korea) ) Lee,S.-H. ( Samsung Electronics Co.,Ltd. (Korea) ) - 掲載資料名:
- 17th Annual BACUS Symposium on Photomask Technology and Management
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3236
- 発行年:
- 1998
- 開始ページ:
- 358
- 終了ページ:
- 365
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819426697 [0819426695]
- 言語:
- 英語
- 請求記号:
- P63600/3236
- 資料種別:
- 国際会議録
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