Clear-field reticle defect disposition for advanced sub-half-micron lithography

Clear-field reticle defect disposition for advanced sub-half-micron lithography

著者名:

Ibsen,K.B. ( Texas Instruments Inc. )
Ilzhoefer,J.R. ( Texas Instruments Inc. )
Eickhoff,M.D. ( KLA-Tencor Corp. )

掲載資料名:

17th Annual BACUS Symposium on Photomask Technology and Management

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

3236

発行年:

1998

開始ページ:

124

終了ページ:

135

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819426697 [0819426695]

言語:

英語

請求記号:

P63600/3236

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00016458
シリーズID:	PA00000029
会議名:	SPIE Photomask Technology : Annual Symposium on Photomask Technology and Management
回次:	1997 : 17th
会議開催地:	Redwood City, California, USA
会議開催年:	1997.09.17-1997.09.19

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