Evaluation of process capabilities for 50 keV with rectangular-shaped beam using computer simulation
- 著者名:
- Cha,B.-C. ( Samsung Electronics Co.,Ltd. (Korea) )
- Kim,Y.-H. ( Samsung Electronics Co.,Ltd. (Korea) )
- Choi,S.-W. ( Samsung Electronics Co.,Ltd. (Korea) )
- Yu,Y.-H. ( Samsung Electronics Co.,Ltd. (Korea) )
- Sohn,J.-M. ( Samsung Electronics Co.,Ltd. (Korea) )
- 掲載資料名:
- 17th Annual BACUS Symposium on Photomask Technology and Management
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3236
- 発行年:
- 1998
- 開始ページ:
- 34
- 終了ページ:
- 41
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819426697 [0819426695]
- 言語:
- 英語
- 請求記号:
- P63600/3236
- 資料種別:
- 国際会議録
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9
国際会議録
Resolution improvement of chemical-amplification resist using process-induced effect correction
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
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