Blank Cover Image

New methodology of simulating pocket-implanted sub-0.18-ｦﾌm CMOS

著者名:
Mehrotra,M. ( Texas Instruments Inc. )
Hu,J.C. ( Texas Instruments Inc. )
Nandakumar,M. ( Texas Instruments Inc. )
Chattenee,A. ( Texas Instruments Inc. )
Rodder,M. ( Texas Instruments Inc. )
Chen,I.-C. ( Texas Instruments Inc. )
さらに 1 件
掲載資料名:
Microelectronic device technology II : 23-24 September, 1998, Santa Clara, California
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
3506
発行年:
1998
開始ページ:
272
終了ページ:
280
出版情報:
Bellingham, Washington: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819429650 [0819429651]
言語:
英語
請求記号:
P63600/3506
資料種別:
国際会議録

類似資料:

1 国際会議録 Tuned MEDICI simulator including inverse short channel effect for sub-0.18-ｦﾌm CMOS technologies

Nandakumar,M., Sridhar,S., Vasanth,K., Hu,J.C., Shiau,W.-T., Mei,P., Rodder,M., Chen,I.-C.

SPIE-The International Society for Optical Engineering
7 国際会議録 Prediction of CMOS transistor performance at 0.10-ｦﾌm gate length using tuned simulations

Sridhar,S., Mehrotra,M., Rodder,M., Nandakumar,M., Chen,I.-C.

SPIE-The International Society for Optical Engineering
2 国際会議録 Applicability of RTCVD and LPCVD nitride spacers for sub-0.18-ｦﾌm CMOS technologies

Shiau,W.-T., Hu,J.C., Rodder,M., Tiner,P., Chen,I.-C.

SPIE-The International Society for Optical Engineering
8 国際会議録 Customized off-axis illumination aperture filtering for sub-0.18-ｦﾌm KrF Lithography

Hsia,C.-C., Gau,T.-S., Yang,C.-H., Liu,R.-C., Chang,C.-H., Chen,L.-J., Wang,C.-M., Chen,J.F., Smith,B.W., Hwang,G.-W., …

SPIE - The International Society for Optical Engineering
3 国際会議録 Optimum junction depth design of the S/D extension regions (MDD) for sub-0.18-ｦﾌm CMOS technologies

Chao,C.-P., Mehrotra,M., Chen,I.-C.

SPIE-The International Society for Optical Engineering
9 国際会議録 Application of attenuated phase-shift masks to sub-0.18-ｦﾌm logic patterns

Fritze,M., Wyatt,P.W., Astolfi,D.K., Davis,P., Curtis,A.V., Preble,D.M., Cann,S.G., Denault,S., Chan,D., Shaw,J.C., …

SPIE - The International Society for Optical Engineering
4 国際会議録 Prediction of 0.18-ｦﾌm CMOS technology performance using tuned device simulation

Nandakumar,M., Rodder,M., Chen,I.-C.

SPIE-The International Society for Optical Engineering
10 国際会議録 Antireflection strategies for sub-0.18-ｦﾌm dual-damascene structure patterning in KrF 248-nm lithography

Chou,S.-Y., Wang,C.-M., Hsia,C.-C., Chen,L.-J., Hwang,G.-W., Lee,S.-D., Lou,J.-C.

SPIE - The International Society for Optical Engineering
5 国際会議録 Shallow source/drain extension formation using antimony and indium pre-amorphization schemes for 0.18- to 0.13-ｦﾌm CMOS technologies

Hu,J.C., Rodder,M., Chen,I.-C.

SPIE-The International Society for Optical Engineering
11 国際会議録 Sheet resistance requirements for the source/drain regions of 0.11-ｦﾌm gate length CMOS technology

Mehrotra,M., Chatterjee,A., Chen,I.-C

SPIE-The International Society for Optical Engineering
6 国際会議録 Evaluation of Mo-doped Ti salicide process for sub-0.18-ｦﾌm CMOS

Chao,C.-P., Kittl,J.A., Hong,Q.-Z., Shiau,W.-T., Rodder,M., Chen,I.-C.

SPIE-The International Society for Optical Engineering
12 国際会議録 Benchmarking of advanced CD-SEMs against the new unified specification for sub-0.18-ｦﾌm lithography

Deleporte,A.G., Allgair,J., Archie,C.N., Banke,G.W., Postek,M.T., Schlesinger,J.E., Vladar,A.E., Yanof,A.W.

SPIE - The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12