Sub-100-nm and deep sub-100-nm MOS transistor gate patterning
- 著者名:
Xiang,Q. ( Advanced Micro Devices,Inc. ) Gupta,S. ( Advanced Micro Devices,Inc. ) Spence,C.A. ( Advanced Micro Devices,Inc. ) Singh,B. ( Advanced Micro Devices,Inc. ) Yeap,G.C.-F. ( Advanced Micro Devices,Inc. ) Lin,M.-R. ( Advanced Micro Devices,Inc. ) - 掲載資料名:
- Microelectronic device technology II : 23-24 September, 1998, Santa Clara, California
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3506
- 発行年:
- 1998
- 開始ページ:
- 243
- 終了ページ:
- 252
- 出版情報:
- Bellingham, Washington: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819429650 [0819429651]
- 言語:
- 英語
- 請求記号:
- P63600/3506
- 資料種別:
- 国際会議録
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8
国際会議録
Investigation of full-field CD control of sub-100-nm gate features by phase-shift 248-nm lithography
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
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SPIE-The International Society for Optical Engineering |
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