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Ultrathin film fully depleted CMOS/SIMOX technology with selective CVD tungsten and its application to LSIs (Invited Paper)

著者名:
  • Sato,Y. ( NTT System Electronics Labs. (Japan) )
  • Kosugi,T. ( NIT Wireless System Labs. (Japan) )
  • shii,H. ( NTT System Electronics Labs. (Japan) )
掲載資料名:
Microelectronic device technology II : 23-24 September, 1998, Santa Clara, California
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
3506
発行年:
1998
開始ページ:
218
終了ページ:
229
出版情報:
Bellingham, Washington: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819429650 [0819429651]
言語:
英語
請求記号:
P63600/3506
資料種別:
国際会議録

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