Ultrathin film fully depleted CMOS/SIMOX technology with selective CVD tungsten and its application to LSIs (Invited Paper)
- 著者名:
- 掲載資料名:
- Microelectronic device technology II : 23-24 September, 1998, Santa Clara, California
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3506
- 発行年:
- 1998
- 開始ページ:
- 218
- 終了ページ:
- 229
- 出版情報:
- Bellingham, Washington: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819429650 [0819429651]
- 言語:
- 英語
- 請求記号:
- P63600/3506
- 資料種別:
- 国際会議録
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A HIGH PERFORMANCE SUBMICROMETER CMOS/SOI TECHNOLOGY USING ULTRATHIN SILICON FILMS ON SIMOX
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