Self-aligned silicide process technology for sub-0.25-ヲフm geometries
- 著者名:
White,T.R. ( Motorola ) Kolar,D. ( Motorola ) Jahanbani,M. ( Motorola ) Frisa,L.E. ( Motorola ) Nagabushnam,R. ( Motorola ) Chuang,H. ( Motorola ) Tsui,P. ( Motorola ) Cope,J. ( Motorola ) Pulvirent,L. ( Motorola ) Bolton,S. ( Motorola ) - 掲載資料名:
- Microelectronic device technology II : 23-24 September, 1998, Santa Clara, California
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3506
- 発行年:
- 1998
- 開始ページ:
- 112
- 終了ページ:
- 119
- 出版情報:
- Bellingham, Washington: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819429650 [0819429651]
- 言語:
- 英語
- 請求記号:
- P63600/3506
- 資料種別:
- 国際会議録
類似資料:
1
国際会議録
Integration of Multi-Level Copper Metallization into a High-Performance Sub-0.25 ヲフm Technology
MRS - Materials Research Society |
SPIE-The International Society for Optical Engineering |
MRS - Materials Research Society |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
MRS - Materials Research Society |
SPIE-The International Society for Optical Engineering |
MRS - Materials Research Society |
SPIE-The International Society for Optical Engineering |
MRS - Materials Research Society |
SPIE-The International Society for Optical Engineering |
MRS - Materials Research Society |