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Conference Proceedings

1. Study of chromeless mask quartz defect detection capability for 80-nm post structure [6349-136]

Lu, J. ; Wang, B. ; Chen, F. F. ; Wang, O. ; Chou, J. ; Lin, O. ; Cheng, J. ; Chen, E. ; Yu, P.

Pub. info.:	Photomask Technology 2006. pp.63493K-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6349

Conference Proceedings

2. Evaluation and implementation of TeraScan reflected light die-to-database inspection mode for 65nm design node process [5992-07]

Hsu, L. T. H. ; Ho, C. H. ; Lin, C. C. ; Hsu, V. ; Chen, E. ; Yu, P. ; Son, K.

Pub. info.:	25th Annual BACUS Symposium on Photomask Technology. pp.599207-599207, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5992

Conference Proceedings

3. Improvement in defect classification efficiency by grouping disposition for reticle inspection [5992-11]

Lai, R. ; Hsu, L. T. H. ; Chang, P. ; Ho, C. H. ; Tsai, F. ; Long, G. ; Yu, P. ; Miller, J. ; Hsu, V. ; Chen, E.

Pub. info.:	25th Annual BACUS Symposium on Photomask Technology. pp.59920B-, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5992

Conference Proceedings

4. Implementation of an efficient defect classification methodology for advanced reticle inspection [5853-126]

Yu, P. ; V. Hsu, ; Chen, E. ; Lai, R. ; Son, K. ; Ma, W. ; Chang, P. ; Chen, J.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XII. pp.345-352, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5853