1.

Conference Proceedings
Conference Proceedings
1. Model-based OPC for first-generation 193-nm lithography
Lucas,K.D. ; Word,J.C. ; Vandenberghe,G.N. ; Verhaegen,S. ; Jonckheere,R.M.
Pub. info.: Optical Microlithography XIV.  4346  pp.119-130,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
2.

Conference Proceedings
Conference Proceedings
2. Reticle quality needs for advanced 193-nm lithography
Jonckheere,R.M. ; Vandenberghe,G.N. ; Wiaux,V. ; Verhaegen,S. ; Ronse,K.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VIII.  pp.108-117,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4409
3.

Conference Proceedings
Conference Proceedings
3. Challenge for sub-100-nm DRAM gate printing using ArF lithography with combination of moderate OAI and attPSM
Kim,Y.-C. ; Vandenberghe,G.N. ; Verhaegen,S. ; Ronse,K.
Pub. info.: 21st Annual BACUS Symposium on Photomask Technology.  4562  pp.954-967,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4562