1.

Conference Proceedings
Conference Proceedings
1. Reduction of mask-induced CD errors by optical proximity correction
Randall,J. ; Tritchkov,A. ; Jonckheere,R. ; Jaenen,P. ; Ronse,K.
Pub. info.: Optical microlithography XI : 25-27 February 1998, Santa Clara, California.  pp.124-130,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3334
2.

Conference Proceedings
Conference Proceedings
2. Automated OPC for application in advanced lithography(Invited Paper)
Ronse,K. ; Tritchkov,A. ; Randall,J. ; Jonckheere,R. ; Ghandehari,K. ; Van den hove,L.
Pub. info.: Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan.  pp.138-144,  1997.  Bellingham, Washington.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3096
3.

Conference Proceedings
Conference Proceedings
3. Optical proximity effects and correction strategies for chemical-amplified DUV resists
Beeck,M.Op de ; Bruggeman,B. ; Botermans,H. ; Driessche,V.Van ; Yen,A. ; Tritchkov,A. ; Jonckheere,R. ; Ronse,K. ; hove,L.Van den
Pub. info.: Optical Microlithography IX.  Part2  pp.622-633,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2726
4.

Conference Proceedings
Conference Proceedings
4. Some challenges for mask making to keep up with the roadmap
Jonckheere,R. ; Randall,J.N. ; Marschner,T. ; Ronse,K.
Pub. info.: 18th Annual BACUS Symposium on Photomask Technology and Management.  pp.313-324,  1998.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3546
5.

Conference Proceedings
Conference Proceedings
5. Top-surface imaging and optical proximity correction:a way to 0.18-ｦﾌm lithography at 248 nm
Goethals,A.M. ; Vertommen,J. ; Roey,F.Van ; Yen,A. ; Tritchkov,A. ; Ronse,K. ; Jonckheere,R. ; hove,L.Van den
Pub. info.: Optical Microlithography IX.  Part1  pp.362-374,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2726