Characterization and improvement of field CD uniformity for implementation of 0.15-μm technology device using KrF stepper
- Author(s):
- Hyun, Y.-S. ( Hynix Semiconductor, Inc. (South Korea) )
- Kim, D.-J. ( Hynix Semiconductor, Inc. (South Korea) )
- Koh, C.-W. ( Hynix Semiconductor, Inc. (South Korea) )
- Park, S.-N. ( Hynix Semiconductor, Inc. (South Korea) )
- Kwon, W.-T. ( Hynix Semiconductor, Inc. (South Korea) )
- Publication title:
- Optical Microlithography XVI
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5040
- Pub. Year:
- 2003
- Vol.:
- Part Two
- Page(from):
- 941
- Page(to):
- 947
- Pages:
- 7
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448453 [0819448451]
- Language:
- English
- Call no.:
- P63600/5040
- Type:
- Conference Proceedings
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