1.

Conference Proceedings
Conference Proceedings
1. Evaluation and comparison of the pattern transfer-induced image placement distortions on e-beam projection lithography masks
Magg,C. ; Lercel,M.J. ; Lawliss,M. ; Ackel,R. ; Caldwell,N. ; Kindt,L. ; Racette,K.C. ; Williams,C. ; Reu,P.L.
Pub. info.: Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA.  pp.374-382,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4343
2.

Conference Proceedings
Conference Proceedings
2. Chemically amplified resists for electron-beam projection lithography mask fabrication
Magg,C. ; Lercel,M.J.
Pub. info.: Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA.  pp.276-283,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3997
3.

Conference Proceedings
Conference Proceedings
3. Image size control in next generation lithography masks
Lercel,M.J. ; Magg,C.
Pub. info.: Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA.  pp.266-275,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3997
4.

Conference Proceedings
Conference Proceedings
4. Next-generation lithography mask development at the NGL-MCOC
Lercel,M.J. ; Racette,K.C. ; Magg,C. ; Lawliss,M. ; Collins,K.W. ; Barrett,M. ; Trybendis,M.J. ; Bouchard,L.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VII.  pp.105-115,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4066
5.

Conference Proceedings
Conference Proceedings
5. Evaluation of an advanced chemically amplified resist for next-generation lithography mask fabrication
Magg,C. ; Lercel,M.J. ; Lawliss,M. ; Kwong,R.W. ; Huang,W.-S. ; Angelopoulos,M.
Pub. info.: 20th Annual BACUS Symposium on Photomask Technology.  pp.707-716,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4186
6.

Conference Proceedings
Conference Proceedings
6. UV inspection of EUV and SCALPEL reticles
Pettibone,D.W. ; Bareket,N. ; Liang,T. ; Stivers,A.R. ; Hector,S.D. ; Mangat,P.J.S. ; Resnick,D.J. ; Lercel,M.J. ; Lawliss,M. ; Magg,C. ; Novembre,A.E. ; Farrow,R.C.
Pub. info.: 20th Annual BACUS Symposium on Photomask Technology.  pp.241-249,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4186
7.

Conference Proceedings
Conference Proceedings
7. Utilization of optical emission endpoint in photomask dry etch processing
Faure,T.B. ; Huynh,C. ; Lercel,M.J. ; Smith,A. ; Wagner,T.
Pub. info.: 21st Annual BACUS Symposium on Photomask Technology.  4562  pp.68-78,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4562
8.

Conference Proceedings
Conference Proceedings
8. Characterization and etching of sputter-deposited absorber films for extreme ultraviolet lithography (EUVL) masks
Racette,K.C. ; Williams,C.T. ; Lercel,M.J.
Pub. info.: 21st Annual BACUS Symposium on Photomask Technology.  4562  pp.883-892,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4562
9.

Conference Proceedings
Conference Proceedings
9. Inspection and repair of EUV
Fisch,E. ; Kindt,L. ; Lercel,M.J. ; Schmidt,M.R.
Pub. info.: 21st Annual BACUS Symposium on Photomask Technology.  4562  pp.480-485,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4562