Blank Cover Image

ADVANCED PHOTO RESIST REMOVAL USING O3 AND MOIST UPW IN SEMICONDUCTOR PRODUCTION

Author(s):
Philit, G.
von Aswege, L.
Madore, M.
Wolke, K.
Clech, M.-C.
Asselin-Degrange, E.
Chabli, A.
Louis, D.
3 more
Publication title:
Cleaning technology in semiconductor device manufacturing VIII : proceedings of the international symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2003-26
Pub. Year:
2003
Page(from):
356
Page(to):
361
Pages:
6
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566774116 [156677411X]
Language:
English
Call no.:
E23400/200326
Type:
Conference Proceedings

Similar Items:

Wolke, K., Riedel, T., Haug, R., De Gendt, S., Heyns, M.M., Meuris, M.

Electrochemical Society

Morita, H., Joo, J.-D., Messoussi, R., Kawada, K., Kim, J.-S., Ohmi, T.

Electrochemical Society

Madore, C., Landolt, D.

Electrochemical Society

Fusalba, F., Cornec, C.Le, Maury, P., Remiat, B., Jousseaume, V., Haxaire, K., Mourier, T., Haumesser, P.H, Maitrejean, …

Electrochemical Society

Afzali,A., Gelorme,J.D., Kosbar,L.L., Neisser,M.O., Brunswold,W., Feild,C., Lawson,M., Varanasi,R.

SPIE-The International Society for Optical Engineering

Younkin,R.J., Berggren,K.K., Cheung,E.L., Johnson,K.S., Prentiss,M.G., Black,A.J., Whitesides,G.M., Ralph,D.C., …

SPIE-The International Society for Optical Engineering

McCormack, K., Ruiz-Yeomans, A.

Electrochemical Society

Madore, C., Landolt, D.

Electrochemical Society

Hebda, A.D., Romero, K.A., Seif, D.M., Peterson, T.W.

Electrochemical Society

T. Taylor, L. Studebaker, C. Li, G. Zhou, T. Ma, D. Kuhn, M. Mierzwinski

Electrochemical Society

O'Kane, W J., Connolly, M.P., McLaughlin, T.K, O'Kane, C.J., McMullin, G.D., Gillespie, A.J., McGarry, M.

Electrochemical Society

Alessandri, M., Bellandi, E., Pipia, F., Crivelli, B., Wolke, K., Schenkl, M.

Electrochemical Society

1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12