Total measurement uncertainty and total process precision evaluation of a structural metrology approach to monitoring post-CMP processes
- Author(s):
- Lu, W. ( IBM Microelectronics Div. (USA) )
- Archie, C.N. ( IBM Microelectronics Div. (USA) )
- Stone, S. ( FEI Co. (USA) )
- Kang, H.H. ( FEI Co. (USA) )
- Chitturi, P.R. ( FEI Co. (USA) )
- Publication title:
- Metrology, Inspection, and Process Control for Microlithography XVIII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5375
- Pub. Year:
- 2004
- Page(from):
- 503
- Page(to):
- 514
- Pages:
- 12
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452887 [0819452882]
- Language:
- English
- Call no.:
- P63600/5375.1
- Type:
- Conference Proceedings
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