Kumar, R. ; Sawhney, H.S. ; Arpa, A. ; Samarasekera, S. ; Aggrawal, M. ; Hsu, S. ; Nister, D. ; Hanna, K.
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Battlespace digitization and network-centric warfare II : 3-5 April 2002, Orlando, [Florida]. pp.211-221, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
Aguirre, A. D. ; Herz, P. R. ; Chen, Y. ; Fujimoto, J. G. ; Piyawattanametha, W. ; Fan, L. ; Hsu, S. ; Fujino, M. ; Wu, M. C. ; Kopf, D.
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Advanced biomedical and clinical diagnostic systems III : 23-26 January 2005, San Jose, California, USA. pp.277-282, 2005. Bellingham, Wash., USA. SPIE - The International Society of Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
Environmental issues with materials and processes for the electronics and semiconductor industries V : proceedings of the international symposium. pp.139-143, 2002. Pennington, N.J.. Electrochemical Society
Laser rader technology and applications X : 31 March-1 April 2005, Orlando, Florida, USA. pp.193-207, 2005. Bellingham, Wash., USA. SPIE - The International Society of Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
Laser radar technology and applications VIII : 22-25 April 2003, Oriando, Florida, USA. pp.209-220, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
Kuijten, J. P. ; Verhappen, A. ; Conley, W. ; van de Goor, S. ; Litt, L. ; Wu, W. ; Lucas, K. ; Roman, B. ; Kasprowicz, B. ; Progler, C. ; Socha, R. ; van den Broeke, D. ; Wampler, K. ; Laidig, T. ; Hsu, S.
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Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA. pp.1557-1561, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
Yang, H. ; Tweet, D.J. ; Stecker, L.H. ; Pan, W. ; Evans, D.R. ; Hsu, S.
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Materials, technology and reliability for advanced interconnects and low-k dielectrics : symposium held April 23-27, 2000, San Francisco, California, U.S.A.. pp.D3.3-, 2001. Warrendale, PA. Materials Research Society
Environmental Issues with Materials and Processes for the Electronics and Semiconductor Industries : proceedings of the fourth International Symposium. pp.9-14, 2001. Pennington, N.J.. Electrochemical Society
Van Den Broeke, D. ; Hsu, M. ; Chen, F. J. ; Hsu, S. ; Hollerbach, U. ; Laidig, Y.
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Photomask and Next-Generation Lithography Mask Technology XIII. pp.62831C-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering