1.

Conference Proceedings
Conference Proceedings
1. Residual Fluorine Effects on High Selectivity HBr/Cl2 Etches
Hemker, D.J. ; Qian, X.Y. ; Lum, R.T. ; Hills, G.W.
Pub. info.: Proceedings of the Symposium on Highly Selective Dry Etching and Damage Control.  pp.149-159,  1993.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 1993-21
2.

Conference Proceedings
Conference Proceedings
2. Minimization of the Profile Microloading in Polysilicon Etching
Lum, R. ; Tsai, P. ; Furr, M. ; Bucknall, R.E. ; Wiltse, M. ; Hills, G.W.
Pub. info.: Proceedings of the tenth symposium on plasma processing.  pp.254-263,  1994.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 1994-20
3.

Conference Proceedings
Conference Proceedings
3. Factors Affecting Charge-up in a Magnetically Enhanced RIE Polysilicon Etcher
Jha, N. ; Shin, H. ; Hills, G.W. ; Qian, X.Y. ; Hu, C.
Pub. info.: Proceedings of the Symposium on Highly Selective Dry Etching and Damage Control.  pp.319-330,  1993.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 1993-21
4.

Conference Proceedings
Conference Proceedings
4. The Development and Performance of an Electrostatic Chuck for Silicon Etches
Su, J. ; Hills, G.W. ; Tsai, P.
Pub. info.: Proceedings of the tenth symposium on plasma processing.  pp.291-299,  1994.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 1994-20
5.

Conference Proceedings
Conference Proceedings
5. Strip Process Optimization for Porous ULK Films
Kalinowski, I.J. ; Bourlot, C. ; Marfoure, A. ; Louveau, O. ; Li, S. ; Su, J. ; Hills, G.W. ; Louis, D.
Pub. info.: Copper Interconnects, New Contact Metallurgies/Structures, and Low-K Interlevel Dielectrics : proceedings of the International Symposium.  pp.216-223,  2003.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-10
6.

Conference Proceedings
Conference Proceedings
6. Characterization of Plasma Strip Processes on OSG Low-k Dielectric Films
Li, S. ; Ostrowski, K. ; Kalinovski, I.J. ; Su, J. ; Hills, G.W.
Pub. info.: Copper Interconnects, New Contact Metallurgies/Structures, and Low-K Interlevel Dielectrics : proceedings of the International Symposium.  pp.224-231,  2003.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-10