1.

Conference Proceedings
Conference Proceedings
1. Nonlinear optical properties of bacteriorhodopsin, retinal, and related molecules
E. Hendrickx ; K.J. Clays ; A. Vinckier ; A.P. Persoons ; C. Dehu
Pub. info.: Nonlinear optical properties of organic materials VIII : 11-13 July 1995, San Diego, California.  pp.180-189,  1995.  Bellingham, WA.  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2527
2.

Conference Proceedings
Conference Proceedings
2. Screening of second-generation high-index liquids
E. Hendrickx ; S. Postnikov ; P. Foubert ; R. Gronheid ; B. Kim
Pub. info.: Advances in resist materials and processing technology XXIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6519
3.

Conference Proceedings
Conference Proceedings
3. Full field EUV lithography: lessons learned on EUV ADT imaging, EUV resist, and EUV reticles
E. Hendrickx ; A. M. Goethals ; A. Niroomand ; R. Jonckheere ; F. Van Roey
Pub. info.: Lithography Asia 2008.  1  pp.714007-1-714007-11,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 7140
4.

Conference Proceedings
Conference Proceedings
4. Hyper-NA imaging of 45nm node random CH layouts using inverse lithography
E. Hendrickx ; A. Tritchkov ; K. Sakajiri ; Y. Granik ; M. Kempsell
Pub. info.: Optical Microlithography XXI.  1  pp.69240L-1-69240L-10,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6924
5.

Conference Proceedings
Conference Proceedings
5. AIMS-45 image validation of contact hole patterns affer inverse lithography at NA 1.35
E. Hendrickx ; R. Birkner ; M. Kempsell ; A. Tritchkov ; G. Vandenberghe
Pub. info.: Photomask technology 2008.  1  pp.71221E-1-71221E-11,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 7122
6.

Conference Proceedings
Conference Proceedings
6. 60nm half pitch contact layer printing: exploring the limits at 1.35NA lithography
J. Bekaert ; E. Hendrickx ; G. Vandenberghe
Pub. info.: Optical Microlithography XXI.  2  pp.69243A-1-69243A-12,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6924
7.

Conference Proceedings
Conference Proceedings
7. Double patterning design split implementation and validation for the 32nm node
M. Drapeau ; V. Wiaux ; E. Hendrickx ; S. Verhaegen ; T. Machida
Pub. info.: Design for manufacturability through design-process integration : 28 February-2 March 2007, San Jose, California, USA.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6521
8.

Conference Proceedings
Conference Proceedings
8. Double pattern EDA solutions for 32nm HP and beyond
G. E. Bailey ; A. Tritchkov ; J. Park ; L. Hong ; V. Wiaux ; E. Hendrickx ; S. Verhaegen ; P. Xie ; J. Versluijs
Pub. info.: Design for manufacturability through design-process integration : 28 February-2 March 2007, San Jose, California, USA.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6521
9.

Conference Proceedings
Conference Proceedings
9. Lithography options for the 32nm half pitch node and their implications on resist and material technology
Q. Gronheid ; E. Hendrickx ; V. Wiaux ; M. Maenhoudt ; M. Goethals
Pub. info.: Quantum optics, optical data storage, and advanced microlithography : 12-14 November 2007, Beijing, China.  pp.68271V-1-68271V-10,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6827