1.

Conference Proceedings
Conference Proceedings
1. SURFACE PREPARATION USING ANHYDROUS FLUORIDE AND AQUEOUS H2O PRIOR TO LOW TEMPERATURE EPITAXIAL SILICON DEPOSITION
Frystak, D.C. ; Wise, R. ; Grothe, P. ; Barnett, J. ; Fowler, B. ; Carpio, R.
Pub. info.: Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.62-70,  1997.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 97-35
2.

Conference Proceedings
Conference Proceedings
2. Controlling Arsenic Autodoping Via Clustered HF Pre-Clean and Low- Temperature Epitaxial Deposition Cap
Wise, R. ; Johnson, E.S. ; Frystak, D.F. ; Violette, K.E. ; Tidwell, N.E. ; Forest, E.
Pub. info.: Chemical vapor deposition : proceedings of the Fourteenth International Conference and EUROCVD-11.  pp.1386-1393,  1997.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 97-25
3.

Conference Proceedings
Conference Proceedings
3. EFFECTIVE INTRINSIC GETITERING FOR 200 mm AND 300 mm P/P- WAFERS IN LOW THERMAL BUDGET 0.13 pm ADVANCED CMOS LOGIC PROCESS
Binns, M.J. ; Bertolini, S. ; Wise, R. ; Myers, D.J. ; McKenna, T.A.
Pub. info.: Semiconductor silicon 2002 : proceedings of the ninth International Symposium on Silicon Materials Science and Technology.  pp.647-657,  2002.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2002-2
4.

Conference Proceedings
Conference Proceedings
4. THE CONTROL OF BORON AUTO-DOPING DURING DEVICE PROCESSING FOR P/P+ EPI WAFERS WITH NO BACK-SURFACE OXIDE SEAL
Binns, M.I. ; Kommu, S. ; Seacrist, M.R. ; Standley, R.W. ; Wise, R. ; Myers, D.J. ; Tisserand, D. ; Doyle, D.
Pub. info.: Semiconductor silicon 2002 : proceedings of the ninth International Symposium on Silicon Materials Science and Technology.  pp.682-693,  2002.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2002-2
5.

Conference Proceedings
Conference Proceedings
5. Investigation of Single-Wafer, Low Temperature Epitaxial Silicon Deposition with Clustered HF Pre- Clean
Wise, R. ; Frystak, D. ; Barnett, J. ; Grothe, P. ; Fowler, B. ; Forest, E.
Pub. info.: Proceedings of the Thirteenth International Symposium on Chemical Vapor Deposition.  pp.287-293,  1996.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 96-5
6.

Conference Proceedings
Conference Proceedings
6. TIME EFFICIENT CORONA DISCHARGE METHODS FOR MAKING CAPACITANCE MEASUREMENTS FOR HIGH-DENSITY DRAM MATERIALS
Crenshaw, D.L. ; Gupta, I.J. ; Lin, B.Y. ; Plumton, D. ; Bevan, M. ; Banerjee, A. ; Wise, R. ; Horner, G.S.
Pub. info.: Silicon materials science and technology : proceedings of the Eighth International Symposium on Silicon Materials Science and Technology.  pp.1610-1620,  1998.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 98-1(2)
7.

Conference Proceedings
Conference Proceedings
7. (4.12) 7:58 - 8:01 PM - SIMS Depth Profiling of Band As Implants in Si1_xGex and Strained Si/Si1_xGex
Bennett, J. ; Kohli, P. ; Wise, R. ; Rodder, M. ; Yu, S. ; Cleavelin, R. ; Pas, M. ; Braithwaite, G. ; Currie, M.T. ; Lochtefeld, A. (SEMATECH)
Pub. info.: SiGe: materials, processing, and devices : proceedings of the First international symposium.  pp.239-242,  2004.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2004-07
8.

Conference Proceedings
Conference Proceedings
8. (18.5) 11:35 - 11:55 AM - Ultra-Shallow Junction Formation in Strained Si/Sil-xGex using Flash-Assist RTA
Kohli, P. ; Wise, R. ; Braithwaite, G. ; Currie, M. T. ; Lochtefeld, A. ; Rodder, M. ; Bennett, J. ; Gostowski, M. ; Nguyen, B. ; Cleavelin, R. ; Yu, S. ; Pas, M. ; Gelpey, J. ; McCoy, S. ; Campion, A. ; Chaumont, M. (SEMATECH)
Pub. info.: SiGe: materials, processing, and devices : proceedings of the First international symposium.  pp.1113-1114,  2004.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2004-07
9.

Conference Proceedings
Conference Proceedings
9. Modeling, Simulation and Control of Single Wafer Process in Cluster Tool Base on FT-IR-Line Sensor
Liu, Shaohua ; Solomon, Peter ; Carpio, R. ; Fowler, B. ; Simmons, D. ; Wang, J. ; Wise, R. ; Imper, G. ; Riley, N. B. ; Moslehi, M. ; Ravindra, N. M.
Pub. info.: Modeling and simulation of thin-film processing : symposium held April 17-20, 1995, San Francisco, California, U.S.A..  pp.269-,  1995.  Pittsburgh.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 389
10.

Conference Proceedings
Conference Proceedings
10. (15.3) 1:50 - 2:10 PM - The Impact of Strained-Si/SiGe Heterostructure Dislocations on the Electrical Activity of Defects
Czerwinski, A. ; Kordas, L. ; Bray, K.R. ; Zhao, W. ; Wise, R. ; Rozgonyi, G. A. (NC St. Univ.)
Pub. info.: SiGe: materials, processing, and devices : proceedings of the First international symposium.  pp.961-972,  2004.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2004-07