1.

Conference Proceedings
Conference Proceedings
1. An efficient resolution enhancement technique flow for 65nm logic poly layer [5853-96]
van Adrichem, P. J. M. ; Chacko, M. ; Kasprowicz, B. S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.109-113,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
2.

Conference Proceedings
Conference Proceedings
2. Reducing alternating phase shift mask (Alt-PSM) write-time through mask data optimization [5853-40]
Kasprowicz, B. S. ; van Adrichem, P. J. M. ; Chacko, M.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.583-588,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853