1.

Conference Proceedings
Conference Proceedings
1. Rigorous EUV mask simulator using 2D and 3D waveguide methods
Zhu, Z. ; Lucas, K. ; Cobb, J.L. ; Hector, S.D. ; Strojwas, A.J.
Pub. info.: Emerging Lithographic Technologies VII.  1  pp.494-503,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5037
2.

Conference Proceedings
Conference Proceedings
2. Three-dimensional modeling of wafer inspection schemes for sub-70-nm lithography
Zhu, Z. ; Swecker, A.L. ; Strojwas, A.J.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVI.  Part One  pp.11-22,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4689
3.

Conference Proceedings
Conference Proceedings
3. A superfast 3D lithography simulator and its application for ULSI printability analysis
Zhu, Z. ; Strojwas, A.J.
Pub. info.: Optical Microlithography XVII.  pp.658-669,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
4.

Conference Proceedings
Conference Proceedings
4. Propagation of EM waves in axial symmetric structures and its implication for 3D rigorous lithography process simulation
Zhu, Z. ; Strojwas, A.J.
Pub. info.: Optical Microlithography XVII.  pp.1387-1396,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
5.

Conference Proceedings
Conference Proceedings
5. METROPOLE-3D: a three-dimensional electromagnetic field simulator for EUV masks under oblique illumination
Zhu, Z. ; Lucas, K.D. ; Cobb, J.L. ; Hector, S.D. ; Strojwas, A.J.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.585-594,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256