1.

Conference Proceedings
Conference Proceedings
1. Device Fabrication and Evaluation of Alternative High-K Dielectrics and Gate Electrodes Using a Non-Self Aligned Gate process
Kim, I. ; Han, S.K. ; Kiether, W. ; Lee, S.J. ; Lee, C.H. ; Luan, H.F. ; Luo, Z. ; Rying, E. ; Wicaksana, Z.Wang D. ; Zhu, W. ; Hauser, J. ; Kiingon, A. ; Kwang, D.L. ; Ma, T.P. ; Maria, J.P. ; Misra, V. ; Osburn, C.M.
Pub. info.: Rapid thermal and other short-time processing technologies II : proceedings of the international symposium.  pp.211-220,  2001.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2001-9
2.

Conference Proceedings
Conference Proceedings
2. Integration Issues with High k Gate Stacks*
Osburn, C.M. ; Han, S.K. ; Kim, I. ; Campbell, S.A. ; Garfunkel, E. ; Gustafson, T. ; Hauser, J. ; King, T.-J. ; Liu, Q. ; Ranade, P. ; Kingon, A. ; Kwong, D.-L. ; Lee, S.J. ; Lee, C.H. ; Lee, J. ; Onishi, K. ; Kang, C.S. ; Choi, R. ; Cho, H. ; Nich, R. ; Lucovsky, G. ; Hong, J.G. ; Ma, T.P. ; Zhu, W. ; Luo, Z. ; Maria, J.P. ; Wicaksana, D. ; Misra, V. ; Lee, J.J. ; Suh, Y.S. ; Parksons, G. ; Niu, D. ; Stemmer, S.
Pub. info.: ULSI Process Integration : proceedings of the International Symposium.  pp.375-390,  2003.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-6
3.

Conference Proceedings
Conference Proceedings
3. Microstructure And Electronic Properties Of Thin Film Nanoporous Silica As A Function Of Processing And Annealing Methods
Caragianis-Broadbridge, C. ; Miecznikowski, J.R. ; Zhu, W. ; Luo, Z. ; Han, J. ; Lehman, A. Hein
Pub. info.: Materials, technology and reliability for advanced interconnects and low-k dielectrics : symposium held April 23-27, 2000, San Francisco, California, U.S.A..  pp.D5.16-,  2001.  Warrendale, PA.  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 612