Improvements in post-OPC data constraints for enhanced process corrections [6154-134]

Improvements in post-OPC data constraints for enhanced process corrections [6154-134]

Author(s):

Burns, R. L. ( IBM SRDE (USA) )

Cui, Y. ( IBM SRDE (USA) )

Zhao, Z. ( IBM SRDE (USA) )

Stobert, I. ( IBM SRDE (USA) )

LaCour, P. ( Mentor Graphics Corp. (USA) )

Yehia, A. ( Mentor Graphics Corp. (USA) )

Madkour, K. ( Mentor Graphics Corp. (USA) )

Gheith , M. ( Mentor Graphics Corp. (USA) )

Seoud, A. ( Mentor Graphics Corp. (USA) )

4 more

Publication title:

Optical Microlithography XIX

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6154

Pub. Year:

2006

Pt.:

3

Page(from):

61543G

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819461971 [0819461970]

Language:

English

Call no.:

P63600/6154

Type:

Conference Proceedings

Details

TDL ID:	ZA00016186
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical Microlithography
Conf. info. (Number):	2006 : 19th
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2006.02.21-2006.02.24

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