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Faster qualification of 193-nm resists for 100-nm development using photo cell monitoring

Author(s):
Jones, C.M. ( Cypress Semiconductor Corp. (USA) )
Kallingal, C. ( Cypress Semiconductor Corp. (USA) )
Zawadzki, M.T. ( Cypress Semiconductor Corp. (USA) )
Jeewakhan, N.N. ( Cypress Semiconductor Corp. (USA) )
Kaviani, N.N. ( Cypress Semiconductor Corp. (USA) )
Krishnan, P. ( Cypress Semiconductor Corp. (USA) )
Klaum, A.D. ( KLA-Tencor Corp. (USA) )
Ess, J.V. ( KLA-Tencor Corp. (USA) )
3 more
Publication title:
Metrology, Inspection, and Process Control for Microlithography XVII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5038
Pub. Year:
2003
Vol.:
2
Page(from):
1231
Page(to):
1241
Pages:
11
Pub. info.:
Bellingham, WA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448439 [0819448435]
Language:
English
Call no.:
P63600/5038
Type:
Conference Proceedings

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