Faster qualification of 193-nm resists for 100-nm development using photo cell monitoring
- Author(s):
Jones, C.M. ( Cypress Semiconductor Corp. (USA) ) Kallingal, C. ( Cypress Semiconductor Corp. (USA) ) Zawadzki, M.T. ( Cypress Semiconductor Corp. (USA) ) Jeewakhan, N.N. ( Cypress Semiconductor Corp. (USA) ) Kaviani, N.N. ( Cypress Semiconductor Corp. (USA) ) Krishnan, P. ( Cypress Semiconductor Corp. (USA) ) Klaum, A.D. ( KLA-Tencor Corp. (USA) ) Ess, J.V. ( KLA-Tencor Corp. (USA) ) - Publication title:
- Metrology, Inspection, and Process Control for Microlithography XVII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5038
- Pub. Year:
- 2003
- Vol.:
- 2
- Page(from):
- 1231
- Page(to):
- 1241
- Pages:
- 11
- Pub. info.:
- Bellingham, WA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448439 [0819448435]
- Language:
- English
- Call no.:
- P63600/5038
- Type:
- Conference Proceedings
Similar Items:
SPIE-The International Society for Optical Engineering |
7
Conference Proceedings
Novel polymeric anionic photo-acid generators (PAGs) and photoresists for sub-100-nm patterning by 193-nm lithography
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
3
Conference Proceedings
Satellite spot defect reduction on 193-nm contact hole lithography using photo cell monitor methodology [6152-180]
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
10
Conference Proceedings
Investigation on the mechanism of the 193-nm resist linewidth reduction during the SEM measurement
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |