Optimal proximity correction: application for flash memory design
- Author(s):
Chen,Y.G. ( Mosel Vitelic Corp. (Taiwan) ) Huang,D.L. ( Mosel Vitelic Corp. (Taiwan) ) Sung,K.T. ( Mosel Vitelic Corp. (Taiwan) ) Chiang,J.J. ( Mosel Vitelic Corp. (Taiwan) ) Yu,M. ( Mosel Vitelic Corp. (Taiwan) ) Teng,F. ( Mosel Vitelic Corp. (Taiwan) ) Chu,L. ( Technology Modeling Associates,Inc. ) Rey,J.C. ( Technology Modeling Associates,Inc. ) Bernard,D.A. ( Technology Modeling Associates,Inc. ) Li,J. ( Technology Modeling Associates,Inc. ) Moroz,V. ( Technology Modeling Associates,Inc. ) Boksha,V.V. ( Technology Modeling Associates,Inc. ) - Publication title:
- Optical microlithography XI : 25-27 February 1998, Santa Clara, California
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3334
- Pub. Year:
- 1998
- Page(from):
- 874
- Page(to):
- 884
- Pub. info.:
- Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819427793 [0819427799]
- Language:
- English
- Call no.:
- P63600/3334
- Type:
- Conference Proceedings
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