1.

Conference Proceedings
Conference Proceedings
1. In-field CD uniformity control by altering transmission distribution of the photomask using ultra fast pulsed laser technology [6283-29]
Morikawa, Y. ; Sutou, T. ; Inazuki, Y. ; Adachi, T. ; Yoshida, Y. ; Kojima, K. ; Sasaki, S. ; Mohri, H. ; Hayashi, N. ; Dmitriev, V. ; Oshemkov, S. ; Zait, E. ; Ben-Zvi, G.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XIII.  pp.62831Y-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6283
2.

Conference Proceedings
Conference Proceedings
2. Dry etch technology development for NIL template [6283-87]
Yoshida, Y. ; Amano, T. ; Sasaki, S. ; Itoh, K. ; Toyama, N. ; Mohri, H. ; Hayashi, N.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XIII.  pp.62833G-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6283
3.

Conference Proceedings
Conference Proceedings
3. PSM quartz etch depth evaluation with an atomic force microscope
Noguchi, K. ; Sasaki, S. ; Yoshida, Y. ; Adachi, T. ; Abe, T. ; Mohri, H. ; Kokubo, H. ; Morikawa, Y. ; Hayashi, N.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.407-414,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
4.

Conference Proceedings
Conference Proceedings
4. Mask CD measurements with an atomic force microscope
Yoshida, Y. ; Sasaki, S. ; Abe, T. ; Mohri, H. ; Hayashi, N.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.759-769,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
5.

Conference Proceedings
Conference Proceedings
5. NIL template making and imprint evaluation [6349-85]
Yoshida, Y. ; Kobiki, A. ; Hiraka, T. ; Yusa, S. ; Sasaki, S. ; Itoh, K. ; Toyama, N. ; Kurihara, M. ; Mohri, H. ; Hayashi, N.
Pub. info.: Photomask Technology 2006.  pp.63492C-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349
6.

Conference Proceedings
Conference Proceedings
6. Defect inspection and repair performance on CPL masks for 90- and 65-nm node line patterns
Morikawa, Y. ; Kojima, K. ; Hashimoto, H. ; Yoshida, Y. ; Sasaki, S. ; Mohri, H. ; Hayashi, N.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.1339-1348,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567