1.

Conference Proceedings
Conference Proceedings
1. Doubly exposed patterning characteristics using two alternating phase-shift masks
Lee,S.-W. ; Shin,I.-G. ; Kim,Y.-H. ; Choi,S.-W. ; Han,W.-S. ; Yoon,H.-S. ; Sohn,J.-M.
Pub. info.: 17th European Conference on Mask Technology for Integrated Circuits and Microcomponents.  pp.32-36,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4349
2.

Conference Proceedings
Conference Proceedings
2. Dose latitude dependency on resist contrast in e-beam mask lithography
Cha,B.-C. ; Moon,S.-Y. ; Ki,W.-T. ; Yang,S.-H. ; Choi,S.-W. ; Han,W.-S. ; Yoon,H.-S. ; Sohn,J.-M.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VII.  pp.200-209,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4066
3.

Conference Proceedings
Conference Proceedings
3. Improved process control of photomask fabrication in e-beam lithography
Cha,B.-C. ; Park,J.-H. ; Choi,Y.-H. ; Kim,J.-M. ; Han,W.-S. ; Yoon,H.-S. ; Sohn,J.-M.
Pub. info.: 20th Annual BACUS Symposium on Photomask Technology.  pp.508-512,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4186