1.

Conference Proceedings
Conference Proceedings
1. Evaluation of lens aberrations depending on the transmittance of DUV-attenuated PSM
Park,J.-H. ; Kim,Y.-H. ; Lim,S.-C. ; Lee,K.-H. ; Choi,S.-W. ; Yoon,H.-S. ; Sohn,J.-M.
Pub. info.: 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California.  Part2  pp.937-942,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3873
2.

Conference Proceedings
Conference Proceedings
2. Analysis of photomask CD errors depending on development methods
Moon,S.-Y. ; Ki,W.-T. ; Cha,B.-C. ; Choi,S.-W. ; Yoon,H.-S. ; Sohn,J.-M.
Pub. info.: 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California.  Part2  pp.573-576,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3873
3.

Conference Proceedings
Conference Proceedings
3. Doubly exposed patterning characteristics using two alternating phase-shift masks
Lee,S.-W. ; Shin,I.-G. ; Kim,Y.-H. ; Choi,S.-W. ; Han,W.-S. ; Yoon,H.-S. ; Sohn,J.-M.
Pub. info.: 17th European Conference on Mask Technology for Integrated Circuits and Microcomponents.  pp.32-36,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4349
4.

Conference Proceedings
Conference Proceedings
4. Dose latitude dependency on resist contrast in e-beam mask lithography
Cha,B.-C. ; Moon,S.-Y. ; Ki,W.-T. ; Yang,S.-H. ; Choi,S.-W. ; Han,W.-S. ; Yoon,H.-S. ; Sohn,J.-M.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VII.  pp.200-209,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4066
5.

Conference Proceedings
Conference Proceedings
5. Evaluation of the practical use of GHOST technique for various e-beam resists
Cha,B.-C. ; Kim,J.-M. ; Kim,B.-G. ; Choi,S.-W. ; Yoon,H.-S. ; Sohn,J.-M.
Pub. info.: 18th Annual BACUS Symposium on Photomask Technology and Management.  pp.55-62,  1998.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3546
6.

Conference Proceedings
Conference Proceedings
6. Correction method for radial effect caused by spin process
Kim,J.-M. ; Choi,S.-W. ; Cha,B.-C. ; Yoon,H.-S. ; Sohn,J.-M.
Pub. info.: 16th Annual BACUS Symposium on Photomask Technology and Management.  pp.466-472,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2884