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10 results

Conference Proceedings

1. 0.13-ｦﾌm optical lithography for random logic devices using 248-nm attenuated phase-shifting masks

Chen,Y.T. ; Lin,C.H. ; Lin,H.T. ; Hsieh,H.C. ; Yu,S.S. ; Yen,A.

Pub. info.:	Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA. Part1 pp.99-110, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4000

Conference Proceedings

2. Combination of OPC and AttPSM for patterning sub-0.18-ｦﾌm logic devices

Kuo,H.J. ; Lin,C.H. ; Tzu,S.D. ; Yen,A.

Pub. info.:	Optical microlithography XII : 17-19 March 1999, Santa Clara, California. Part1 pp.435-445, 1999. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3679

Conference Proceedings

3. Sub-0.18-ｦﾌm line/space lithography using 248-nm scanners and assisting feature OPC masks

Lin,H.T. ; Lin,J.C.H. ; Chiu,C.S.G. ; Wang,Y.Y. ; Yen,A.

Pub. info.:	19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California. Part1 pp.307-315, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3873

Conference Proceedings

4. Study of pupil filters for depth of focus enhancement in printing contact holes

Wang,C.-M. ; Yu,S.-S. ; Yen,A.

Pub. info.:	Optical microlithography XII : 17-19 March 1999, Santa Clara, California. Part2 pp.783-791, 1999. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3679

Conference Proceedings

5. Characterization and optimization of CD control for 0.25-ｦﾌm CMOS applications

Ronse,K. ; Beeck,M.Opde ; Yen,A. ; Kim,K.-H. ; hove,L.Van den

Pub. info.:	Optical Microlithography IX. Part2 pp.555-563, 1996. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2726

Conference Proceedings

6. Optical proximity effects correction at 0.25ｦﾌm incorporating process variations in lithography

Tritchkov,A. ; Rieger,M.L. ; Stirniman,J.P. ; Yen,A. ; Ronse,K. ; Vandenberghe,G. ; hove,L.Van den

Pub. info.:	Optical Microlithography X. pp.726-738, 1997. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3051

Conference Proceedings

7. Optical proximity effects and correction strategies for chemical-amplified DUV resists

Beeck,M.Op de ; Bruggeman,B. ; Botermans,H. ; Driessche,V.Van ; Yen,A. ; Tritchkov,A. ; Jonckheere,R. ; Ronse,K. ; hove,L.Van den

Pub. info.:	Optical Microlithography IX. Part2 pp.622-633, 1996. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2726

Conference Proceedings

8. Trench pattern lithography for 0.13- and 0.10-μm logic devices at 248- and 193-nm wavelengths

Wang,Y.-Y. ; Lin,H.-T. ; Yu,S.-S. ; Chen,C.-K. ; Ku,Y.-C. ; Yen,A. ; Lin,B.J.

Pub. info.:	Optical Microlithography XIV. 4346 pp.276-292, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4346

Conference Proceedings

9. Printing 0.13-μm contact holes using 193-nm attenuated phase-shifting masks

Wang,C.-M.A. ; Lin,S.-J. ; Lin,C.-H. ; Ku,Y.-C. ; Yen,A.

Pub. info.:	20th Annual BACUS Symposium on Photomask Technology. pp.275-286, 2000. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4186

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Conference Proceedings

10. Top-surface imaging and optical proximity correction:a way to 0.18-ｦﾌm lithography at 248 nm

Goethals,A.M. ; Vertommen,J. ; Roey,F.Van ; Yen,A. ; Tritchkov,A. ; Ronse,K. ; Jonckheere,R. ; hove,L.Van den

Pub. info.:	Optical Microlithography IX. Part1 pp.362-374, 1996. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2726

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