1.

Conference Proceedings
Conference Proceedings
1. Trench pattern lithography for 0.13- and 0.10-μm logic devices at 248- and 193-nm wavelengths
Wang,Y.-Y. ; Lin,H.-T. ; Yu,S.-S. ; Chen,C.-K. ; Ku,Y.-C. ; Yen,A. ; Lin,B.J.
Pub. info.: Optical Microlithography XIV.  4346  pp.276-292,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
2.

Conference Proceedings
Conference Proceedings
2. Printing 0.13-μm contact holes using 193-nm attenuated phase-shifting masks
Wang,C.-M.A. ; Lin,S.-J. ; Lin,C.-H. ; Ku,Y.-C. ; Yen,A.
Pub. info.: 20th Annual BACUS Symposium on Photomask Technology.  pp.275-286,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4186