Lee, M. K. ; Yedur, S. ; Hetzer, D. ; Tavassoli, M. ; Baik, K.
Pub. info.:
EMLC 2006 : 22nd European Mask and Lithography Conference : 23-26 January 2006, Dresden, Germany. pp.62810Z-, 2006. Bellingham, Wash.,. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Lee, K. ; Yedur, S. ; Cheng, W. ; Tovassoli, M. ; Baik, K.
Pub. info.:
Photomask and Next-Generation Lithography Mask Technology XIII. pp.628313-628313, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Lee, K. M. ; Yedur, S. ; Henrichs, S. ; Tavassoli, M.
Pub. info.:
Metrology, Inspection, and Process Control for Microlithography XX. pp.61521P-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering