1.

Conference Proceedings
Conference Proceedings
1. Scatterometry based CD and profile metrology of chrome-less masks using optical digital profilometry [6283-111]
Lee, K. ; Yedur, S. ; Cheng, W. ; Tovassoli, M. ; Baik, K.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XIII.  pp.628313-628313,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6283
2.

Conference Proceedings
Conference Proceedings
2. Contact hole CD and profile metrology of binary and phase-shift masks: effect of modeling strategies in application of scafferometery [6349-22]
Lee, K. ; Yedur, S. ; Tavassoli, M. ; Baik, K. ; Tabet, M.
Pub. info.: Photomask Technology 2006.  pp.63490M-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349