1.

Conference Proceedings
Conference Proceedings
1. High NA polarized light lithography for O.29kl process [6154-15]
Park, C. ; Lee, J. ; Yang, K. ; Tseng, S. ; Min, Y.-H ; Yang, H. ; Yim, D. ; Kim, J.
Pub. info.: Optical Microlithography XIX.  pp.61540F-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6154
2.

Conference Proceedings
Conference Proceedings
2. Characterizing optical proximity effect difference among exposure tools [6152-103]
Hong, J. ; Lee, J. ; Kang, E. ; Yang, H. ; Yim, D. ; Kim, J.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XX.  pp.61522N-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6152