1.

Conference Proceedings
Conference Proceedings
1. In-line-focus monitoring technique using lens aberration effect
Yang, H. ; Choi, J. ; Cho, B. ; Yim, D. ; Kim, J.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XIX.  pp.1-8,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5752
2.

Conference Proceedings
Conference Proceedings
2. New OPC verification method using die-to-database inspection [6152-119]
Yang, H. ; Choi, J. ; Cho, B ; Hong, J. ; Song, J. ; Yim, D. ; Kim, J. ; Yamamoto. M.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XX.  pp.615232-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6152