1.

Conference Proceedings
Conference Proceedings
1. PEAK-TO-PEAK VOLTAGE (Vp-p) ON Rf POWERED-ELECTRODE AND SENSITIVITY OF AMORPHOUSE SILICON (A-Si) PHOTORECEPTOR
Yamazaki, T. ; Kobayashi, N. ; Takahashii, S. ; Nakanishi, T.
Pub. info.: Amorphous silicon technology, 1990 : symposium held April 17-20, 1990, San Francisco, California, U.S.A..  pp.435-440,  1990.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 192
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Conference Proceedings
Conference Proceedings
2. PROPERTIES OF DOPED a-Si:H FILMS DEPOSITED BY ECR PLASMA CVD
Murai, H. ; Hayama, M. ; Kobayashi, K. ; Yamazaki, T.
Pub. info.: Chemical perspectives of microelectronic materials II : symposium held November 26-28, 1990, Boston, Massachusetts, U.S.A..  pp.283-288,  1991.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 204
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Conference Proceedings
Conference Proceedings
3. *PHOTO-EXCITED CLEANING OF SILICON WITH CHLORINE AND FLUORINE
Ito, T. ; Sugino, R. ; Sato, Y. ; Okuno, M. ; Osawa, A. ; Aoyama, T. ; Yamazaki, T. ; Arimoto, Y.
Pub. info.: Chemical surface preparation, passivation, and cleaning for semiconductor growth and processing : symposium held April 27-29, 1992, San Francisco, California, U.S.A..  pp.195-206,  1992.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 259
4.

Conference Proceedings
Conference Proceedings
4. Hyper-numerical aperture imaging challenges for 193 nm
Mizoguchi, H. ; Inoue, T. ; Fujimoto, J. ; Yamazaki, T. ; Suzuki, T. ; Matsunaga, T. ; Sakanishi, S. ; Kaminishi, M. ; Watanabe, Y. ; Ohta, T. ; Nakane, M. ; Moriya, M. ; Nakaike, T. ; Shinbori, M. ; Yoshino, M. ; Kawasuji, T. ; Nogawa, H. ; Ito, T. ; Umeda, H. ; Tanaka, S. ; Taniguchi, H. ; Sasaki, Y. ; Kinoshita, J. ; Abe, T. ; Tanaka, H. ; Hayashi, H. ; Miyao, K. ; Niwano, M. ; Kurosu, A. ; Yashiro, M. ; Nagano, H. ; Matsui, N. ; Mimura, T. ; Kakizaki, K. ; Goto, M.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.69-79,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
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Conference Proceedings
Conference Proceedings
5. Advanced process control for deep sub-100nm gate fabrication
Goto, T. K. ; Tajima, M. ; Harada, F. ; Kato, T. ; Yamazaki, T. ; Taguchi, T.
Pub. info.: Data analysis and modeling for process control II : 3-4 March, 2005, San Jose, California, USA.  pp.18-28,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5755
6.

Conference Proceedings
Conference Proceedings
6. Relaxation of Thermal Stresses in Planar SOFC Stacks
Yamazakl, Y. ; Namikawa, T. ; Oishi, N. ; Yamazaki, T.
Pub. info.: Proceedings of the Fourth International Symposium on Solid Oxide Fuel Cells (SOFC-IV).  pp.236-244,  1995.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 95-1
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Conference Proceedings
Conference Proceedings
7. Phased Array Antenna for Telemetry System
Fukutani, K. ; Yamazaki, T. ; Sunaoka, M.
Pub. info.: AP 2000 : millennium Conference on Antennas & Propagation, Davos, Switzerland, 9-14 April 2000.  2000.  Noordwijk, Netherlands.  ESA Publications Division
Title of ser.: ESA SP
Ser. no.: 444
8.

Conference Proceedings
Conference Proceedings
8. VISCOSITIES OF ALKALI CARBONATE MELTS FOR MCFC
Sato, Y. ; Yamamura, T. ; Zhu, H. ; Endo, M. ; Yamazaki, T. ; Kato, H. ; Ejima, T. ; Janz, G.J.
Pub. info.: Proceedings of the Third International Symposium on Carbonate Fuel Cell Technology.  pp.416-428,  1993.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 1993-3
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Conference Proceedings
Conference Proceedings
9. DEPOSITION KINETICS OF a-Si:H AND a-SiC:H FOR FABRICATION OF a-Si/a-SiC DOUBLE-LAYERED PHOTORECEPTOR
Nakanishi, T. ; Marukawa, Y. ; Takahashi, S. ; Yamazaki, T. ; Moriguchi, H.
Pub. info.: Amorphous silicon technology : symposium held April 5-8, 1988, Reno, Nevada, U.S.A..  pp.55-60,  1988.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 118
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Conference Proceedings
Conference Proceedings
10. Application of Photoacoustic Spectroscopy to Porous Silicon
Ohmukai, M. ; Kobayashi, A. ; Uehara, N. ; Yamazaki, T. ; Fujihara, S. ; Tsutsumi, Y.
Pub. info.: Luminescent materials : symposium held April 5-8, 1999, San Francisco, California, U.S.A..  pp.163-,  1999.  Warrendale, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 560
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Conference Proceedings
Conference Proceedings
11. The Effect of Post-Anodization Chemical Etching on Porous Silicon Investigated by Means of Photoluminescence and IR Spectroscopy
Uehara, N. ; Yamazaki, T. ; Kobayashi, A. ; Fujihara, S. ; Ohmukai, M. ; Tsutsumi, Y.
Pub. info.: Luminescent materials : symposium held April 5-8, 1999, San Francisco, California, U.S.A..  pp.157-,  1999.  Warrendale, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 560
12.

Conference Proceedings
Conference Proceedings
12. Chemical Stability of SC1-Cleaned Hydrogen Terminated Si(100) Surfaces
Bjorkman, C. H. ; Nishimura, H. ; Yamazaki, T. ; Alay, J. L. ; Fukuda, M. ; Hirose, M.
Pub. info.: Ultraclean semiconductor processing technology and surface chemical cleaning and passivation : Symposum held April 17-19, 1995, San Francisco, California, USA.  pp.177-,  1995.  Pittsburgh, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 386
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Conference Proceedings
Conference Proceedings
13. Magnetization Process in Cr Substituted Diluted Magnetic Semiconductor Films
Adachi, N. ; Hirano, J. ; Yamazaki, T. ; Okuda, T. ; Kitazawa, H. ; Kido, G.
Pub. info.: High-density magnetic recording and integrated magneto-optics, materials and devices : symposium held April 12-16, 1998, San Francisco, California, U.S..  pp.633-,  1998.  Warrendale, Penn.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 517
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Conference Proceedings
Conference Proceedings
14. Degradation of zinc oxide varistors
Takahashi, Ken ; Miyoshi, T. ; Maeda, K. ; Yamazaki, T. ; Ohwada, S.
Pub. info.: Grain boundaries in semiconductors : proceedings of the Materials Research Society annual meeting, November 1981, Boston Park Plaza Hotel, Boston, Massachusetts, U.S.A..  pp.399-404,  1982.  New York.  North-Holland
Title of ser.: Materials Research Society symposia proceedings
Ser. no.: 5
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Conference Proceedings
Conference Proceedings
15. INFRARED SPECTRA OF ULTRA-THIN SiO2 GROWN ON Si SURFACES
Yamazaki, T. ; Miyazaki, S. ; Bjorkman, C. H. ; Fukuda, M. ; Hirose, M.
Pub. info.: Interface control of electrical, chemical, and mechanical properties : symposium held November 29-December 3, 1993, Boston, Massachusetts, U.S.A..  pp.419-,  1994.  Pittsburgh.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 318
16.

Conference Proceedings
Conference Proceedings
16. IN-SITU RECOVERY OF BITUMEN F ROM DEEP OIL SAND FORMATION MODEL BY STEAM FLOODING UNDER HIGH PRESSURE AND TEMPERATURE
Yamazaki, T. ; Ito, H. ; Roces, S. ; Hashioka, Y. ; Tsuji, T.
Pub. info.: AIChE SPRING MEETING -NEW ORLEANS, LA -03/29/92- 04/02/92.  1992.  New York.  American Institute of Chemical Engineers
Title of ser.: AIChE meeting [papers]
Ser. no.: 1992
17.

Conference Proceedings
Conference Proceedings
17. THE APPLICATION OF HYDROGENATION TO AMORPHOUS SILICON THIN FILM TRANSISTORS FOR THE DECREASE OF THE OFF CURRENT
Kobayashi, K. ; Murai, H. ; Hayama, M. ; Yamazaki, T.
Pub. info.: Amorphous silicon technology 1991 : symposium held April 30-May 3, 1991, Anaheim, California, U.S.A..  pp.321-326,  1991.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 219
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Conference Proceedings
Conference Proceedings
18. Microstructure Change during Superplastic Deformation in (α+γ) Duplex Stainless Steel
Yamazaki, T. ; Mizuno, Y. ; Furuhara, T. ; Maki, T.
Pub. info.: Towards innovation in superplasticity II : proceedings of the 2nd International Conference "Towards Innovation in Superplasticity", held in Kobe City, Japan, September 1998.  pp.127-132,  1999.  Tuerich, Switzerland.  Trans Tech Publications
Title of ser.: Materials science forum
Ser. no.: 304-306
19.

Conference Proceedings
Conference Proceedings
19. Incoherent High-Resolution Z-Contrast Imaging of Silicon and Gallium Arsenide Using HAADF-STEM
Kikuchi, Y. ; Kotaka, Y. ; Watanabe, K. ; Yamazaki, T.
Pub. info.: Advances in materials problem solving with the electron microscope : symposium held November 30-December 3, 1999, Boston, Massachusetts, U.S.A..  pp.185-190,  2001.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 589
20.

Technical Paper
Technical Paper
20. Analysis of Cyclic Variations of Combustion in High Compression Ratio Boosted D.I.S.I. Engine by Ion-Current Probes and CFD.
Tanaka, D. ; Oki, H. ; Yamazaki, T. ; Miura, A. ; Tsukahara, E.
Pub. info.: 2009 SAE world congress : technical paper.  2009.  Warrendale, Penn..  Society of Automotive Engineers
Title of ser.: Society of Automotive Engineers technical paper series
Ser. no.: 2009
21.

Technical Paper
Technical Paper
21. Development of Continuous Variable Valve Event and Lift Control System for SI Engine. (VEL)
Yamada, Y. ; Machida, K. ; Yamazaki, T.
Pub. info.: 2008 SAE world congress : technical paper.  2008.  Warrendale, Penn..  Society of Automotive Engineers
Title of ser.: Society of Automotive Engineers technical paper series
Ser. no.: 2008
22.

Conference Proceedings
Conference Proceedings
22. GT40A: durable 45-W ArF injection-lock laser light source fordryjimmersion lithography [6154-99]
Tanaka, S. ; Tsushima, H. ; Nakaike, T. ; Yamazaki, T. ; Saito, T. ; Tomaru, H. ; Kakizaki, K. ; Matsunaga, T. ; Suzuki, T. ; Wakabayashi, O. ; Nagai, S. ; Fujimoto, J. ; Inoue, T. ; Mizoguchi, H
Pub. info.: Optical Microlithography XIX.  pp.61542O-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6154
23.

Conference Proceedings
Conference Proceedings
23. Ultra line-narrowed ArF excimer laser G42A for sub-90-nm lithography generation
Saito, T. ; Suzuki, T. ; Yoshino, M. ; Wakabayashi, O. ; Matsunaga, T. ; Fujimoto, J. ; Kakizaki, K. ; Yamazaki, T. ; Inoue, T. ; Terashima, K. ; Enami, T. ; Inoue, H. ; Sumitani, A. ; Tomaru, H. ; Mizoguchi, H.
Pub. info.: Optical Microlithography XVI.  Part Three  pp.1704-1711,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
24.

Conference Proceedings
Conference Proceedings
24. Dry-etch resistance of fluorine functionalized polymers
Koh, M. ; Ishikawa, T. ; Araki, T. ; Aoyama, H. ; Yamashita, T. ; Yamazaki, T. ; Watanabe, H. ; Toriumi, M. ; Itani, T.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part One  pp.486-496,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
25.

Conference Proceedings
Conference Proceedings
25. 157-nm single-layer resists based on advanced fluorinated polymers
Shida, N. ; Watanabe, H. ; Yamazaki, T. ; Ishikawa, S. ; Toriumi, M. ; Itani, T.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part One  pp.497-503,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
26.

Conference Proceedings
Conference Proceedings
26. Fluoropolymer resists for 157-nm lithography
Toriumi, M. ; Shida, N. ; Watanabe, H. ; Yamazaki, T. ; Ishikawa, S. ; Itani, T.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part One  pp.191-199,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
27.

Conference Proceedings
Conference Proceedings
27. Development of high-power ArF/F2 laser platform for VUV microlithography
Kakizaki, K. ; Fujimoto, J. ; Yamazaki, T. ; Suzuki, T. ; Matsunaga, T. ; Kawasuji, Y. ; Watanabe, Y. ; Kaminishi, M. ; Inoue, T. ; Mizoguchi, H. ; Kumazaki, T. ; Ariga, T. ; Watanabe, T. ; Yabu, T. ; Sasano, K. ; Hori, T. ; Wakabayashi, O. ; Sumitani, A.
Pub. info.: Optical Microlithography XVII.  pp.1805-1814,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
28.

Conference Proceedings
Conference Proceedings
28. Performance of a novel 43-cm x 43-cm flat-panel detector with CsI:Tl scintillator
Yamazaki, T. ; Tamura, T. ; Nokita, M. ; Okada, S. ; Hayashida, S. ; Ogawa, Y.
Pub. info.: Medical Imaging 2004: Physics of Medical Imaging.  pp.379-385,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5368
29.

Conference Proceedings
Conference Proceedings
29. A method to measure the presampling MTF using a novel edge test device and algorithm
Yamazaki, T. ; Nokita, M. ; Hayashida, S. ; Inoue, H.
Pub. info.: Medical Imaging 2004: Physics of Medical Imaging.  pp.696-704,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5368
30.

Conference Proceedings
Conference Proceedings
30. Local IP evaluations of EPL reticle with 4 mm-sq Si membranes [5853-118]
Koike, K. ; Sakaue, H. ; Arimoto, H. ; Yamazaki, T. ; Sugimura, H. ; Susa, T. ; Itoh, K. ; Tamura, A.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.289-296,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
31.

Conference Proceedings
Conference Proceedings
31. Stencil pattern accuracy of EPL masks [5853-77]
Sugimura, H. ; Yamazaki, T. ; Susa, T. ; Negishi, Y. ; Yoshii, T. ; Eguchi, H. ; Tamura, A.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.884-891,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
32.

Conference Proceedings
Conference Proceedings
32. Image placement of large window-size membrane for EPL and LEEPL mask [5853-80]
Eguchi, H. ; Sumida, T. ; Susa, T. ; Negishi, Y. ; Kurosu, T. ; Yoshii, T. ; Yamazaki, T. ; Yotsui, K. ; Sugimura, H. ; Tamura, A.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.910-920,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
33.

Conference Proceedings
Conference Proceedings
33. Novel main-chain-fluorinated polymers for 157-nm photoresists
Toriumi, M. ; Koh, M. ; Ishikawa, T. ; Kodani, T. ; Araki, T. ; Aoyama, H. ; Yamashita, T. ; Yamazaki, T. ; Furukawa, T. ; Itani, T.
Pub. info.: Advances in Resist Technology and Processing XX.  1  pp.53-60,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039
34.

Conference Proceedings
Conference Proceedings
34. Synthesis of novel fluorinated norbornene derivatives for 157-nm application
Koh, M. ; Ishikawa, T. ; Toriumi, M. ; Araki, T. ; Yamashita, T. ; Aoyama, H. ; Yamazaki, T. ; Furukawa, T. ; Itani, T.
Pub. info.: Advances in Resist Technology and Processing XX.  1  pp.589-599,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039
35.

Conference Proceedings
Conference Proceedings
35. Development and characterization of new 157-nm photoresists based on advanced fluorinated polymers
Yamazaki, T. ; Furukawa, T. ; Itani, T. ; Ishikawa, T. ; Koh, M. ; Araki, T. ; Toriumi, M. ; Kodani, T. ; Aoyama, H. ; Yamashita, T.
Pub. info.: Advances in Resist Technology and Processing XX.  1  pp.103-112,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039