Search records | 東京工業大学附属図書館文献データベース

Sort order

4 results

Conference Proceedings

1. Dry-etch resistance of fluorine functionalized polymers

Koh, M. ; Ishikawa, T. ; Araki, T. ; Aoyama, H. ; Yamashita, T. ; Yamazaki, T. ; Watanabe, H. ; Toriumi, M. ; Itani, T.

Pub. info.:	Advances in Resist Technology and Processing XIX. Part One pp.486-496, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4690

Conference Proceedings

2. Novel main-chain-fluorinated polymers for 157-nm photoresists

Toriumi, M. ; Koh, M. ; Ishikawa, T. ; Kodani, T. ; Araki, T. ; Aoyama, H. ; Yamashita, T. ; Yamazaki, T. ; Furukawa, T. ; Itani, T.

Pub. info.:	Advances in Resist Technology and Processing XX. 1 pp.53-60, 2003. Bellingham, CA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5039

Conference Proceedings

3. Synthesis of novel fluorinated norbornene derivatives for 157-nm application

Koh, M. ; Ishikawa, T. ; Toriumi, M. ; Araki, T. ; Yamashita, T. ; Aoyama, H. ; Yamazaki, T. ; Furukawa, T. ; Itani, T.

Pub. info.:	Advances in Resist Technology and Processing XX. 1 pp.589-599, 2003. Bellingham, CA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5039

Conference Proceedings

4. Development and characterization of new 157-nm photoresists based on advanced fluorinated polymers

Yamazaki, T. ; Furukawa, T. ; Itani, T. ; Ishikawa, T. ; Koh, M. ; Araki, T. ; Toriumi, M. ; Kodani, T. ; Aoyama, H. ; Yamashita, T.

Pub. info.:	Advances in Resist Technology and Processing XX. 1 pp.103-112, 2003. Bellingham, CA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5039