Molecular contamination control technologies for high-volume production phase in high-NA 193nm lithography
- Author(s):
T. Nakano ( Nichias Corp. (Japan) ) T. Tanahashi ( Nichias Corp. (Japan) ) A. Imai ( Nichias Corp. (Japan) ) K. Yamana ( Nichias Corp. (Japan) ) T. Shimotsu ( Nichias Corp. (Japan) ) N. Takahashi ( Tokyo Electron AT Ltd. (Japan) ) M. Shioguchi ( Tokyo Electron Kyushu Ltd. (Japan) ) Y. Matsuda ( Tokyo Electron Kyushu Ltd. (Japan) ) J. Kitano ( Tokyo Electron Kyushu Ltd. (Japan) ) - Publication title:
- Advances in resist materials and processing technology XXIV
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6519
- Pub. Year:
- 2007
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819466389 [0819466387]
- Language:
- English
- Call no.:
- P63600/6519
- Type:
- Conference Proceedings
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