1.

Conference Proceedings
Conference Proceedings
1. Copper Diffusion and Corrosion Behavior Through the Hillock Defect Found Beneath the Weak SiN Dielectric Barrier in Dual Damascene Process
S. Kim ; C. Shim ; J. Hong ; H. Lee ; J. Han ; K. Kim ; Y. Kim
Pub. info.: Dielectrics for nanosystems II: materials science, processing, reliability, and manufacturing.  pp.237-242,  2006.  Pennington, N.J..  Electrochemical Society
Title of ser.: ECS transactions
Ser. no.: 2(1)
2.

Conference Proceedings
Conference Proceedings
2. The choice of mask in consideration of polarization effects at high NA system
S. Kim ; S. Yu ; Y. Kim ; J. Lee ; H. Cho
Pub. info.: Optical microlithography XX.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6520
3.

Conference Proceedings
Conference Proceedings
3. OPC in memory-device patterns using boundary layer model for 3-dimensional mask topographic effect
Y. Kim ; I. Kim ; J. Park ; S. Kim ; S. Suh ; Y. Cheon ; S. Lee ; J. Lee ; C. Kang ; J. Moon ; J. Cobb ; S. Lee
Pub. info.: Optical microlithography XX.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6520
4.

Conference Proceedings
Conference Proceedings
4. Merged contact OPC using pattern type specific modeling and correction
S. Suh ; S. Kim ; S. Lee ; Y. Kim ; J. Lee ; C. Kang
Pub. info.: Photomask and next-generation lithography mask technology XIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6607
5.

Conference Proceedings
Conference Proceedings
5. Three-dimensional mask effect approximate modeling for sub-50-nm node device OPC
S. Suh ; S. Lee ; K. Back ; Y. Kim ; S. Kim ; Y. Chun
Pub. info.: Design for manufacturability through design-process integration : 28 February-2 March 2007, San Jose, California, USA.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6521
6.

Conference Proceedings
Conference Proceedings
6. Gamut mapping method for ICC saturated intent
M. Cho ; H. Choh ; S. Kim ; Y. Kim ; Y. Bang
Pub. info.: Color imaging XII : processing, hardcopy, and applications : 30 January-1 February 2007, San Jose, California, USA.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6493