1.

Conference Proceedings
Conference Proceedings
1. Effects of Organic Additives on the Residual Stress of Ni and Ni Alloys Electrodeposited from the Sulfamate Bath
H. Kim ; Y. Kim ; S. Lee ; J. Lee ; M. Lee
Pub. info.: Magnetic Materials, Processes, and Devices 10.  pp.167-175,  2009.  Pennington, NJ.  Electrochemical Society
Title of ser.: ECS transactions
Ser. no.: 16(45)
2.

Conference Proceedings
Conference Proceedings
2. Structural and Electrical Properties of High Pressure Hydrogen Post-Annealed Pt-Er Alloy Metal Gate on HfO2 Film
C. Choi ; M. Jang ; Y. Kim ; M. Jeon ; S. Lee ; H. Yang ; R. Jung ; M Chang ; H. Hwang
Pub. info.: Advanced gate stack, source/drain and channel engineering for Si-based CMOS 3 : new materials, processes and equipment.  pp.295-302,  2007.  Pennington, NJ.  Electrochemical Society
Title of ser.: ECS transactions
Ser. no.: 6(1)
3.

Technical Paper
Technical Paper
3. A Study on the Development of Modeling and Simulation Framework for Anti-Submarine Weapon System Simulation
CD-ROM
Pub. info.: AIAA meeting papers on disc.  2008.  Reston, Va..  American Institute of Aeronautics and Astronautics
Title of ser.: AIAA Paper : AIAA Modeling and Simulation Technologies Conference
Ser. no.: 2008
4.

Conference Proceedings
Conference Proceedings
4. OPC in memory-device patterns using boundary layer model for 3-dimensional mask topographic effect
Y. Kim ; I. Kim ; J. Park ; S. Kim ; S. Suh ; Y. Cheon ; S. Lee ; J. Lee ; C. Kang ; J. Moon ; J. Cobb ; S. Lee
Pub. info.: Optical microlithography XX.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6520
5.

Conference Proceedings
Conference Proceedings
5. Merged contact OPC using pattern type specific modeling and correction
S. Suh ; S. Kim ; S. Lee ; Y. Kim ; J. Lee ; C. Kang
Pub. info.: Photomask and next-generation lithography mask technology XIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6607
6.

Conference Proceedings
Conference Proceedings
6. Three-dimensional mask effect approximate modeling for sub-50-nm node device OPC
S. Suh ; S. Lee ; K. Back ; Y. Kim ; S. Kim ; Y. Chun
Pub. info.: Design for manufacturability through design-process integration : 28 February-2 March 2007, San Jose, California, USA.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6521
7.

Conference Proceedings
Conference Proceedings
7. Optimization of mask manufacturing rule check constraint for model based assist feature generation
S. Shim ; Y. Kim ; Y. Chun ; S. Lee
Pub. info.: Lithography Asia 2008.  2  pp.714030-1-714030-9,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 7140
8.

Conference Proceedings
Conference Proceedings
8. Study of the mask topography effect on the OPC modeling of hole patterns
S. Shim ; Y. Kim ; S. Lee ; S. Choi ; W. Han
Pub. info.: Optical Microlithography XXI.  3  pp.69243R-1-69243R-8,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6924
9.

Conference Proceedings
Conference Proceedings
9. Image quality difference modelling of a mobile display
J. J. Yoo ; Y. Kim ; M. R. Luo ; W. Choi ; S. Lee ; D. S. Park ; C. Y. Kim
Pub. info.: Image quality and system performance IV : 30 January-1 February 2007, San Jose, California, USA.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6494