J. C. Lee ; R. Choi ; K. Onishi ; N. Cho ; C. Kang ; Y. Kim ; S. Krishnan
Pub. info.:
Physicas and technology of high-k gate dielectrics : proceedings of the International Symposium on High Dielectric Constant Materials : Materials Science, Processing, and Reliability, and Manufacturing Issues. pp.171-178, 2002. Pennington, NJ. Electrochemical Society