Film stress and geometry effects in chrome photomask cleaning damage

Author(s):

• Alpay,H.U. ( DuPont Photomasks,Inc. )
• Wood,J.L. ( DuPont Photomasks,Inc. )
• Kalk,F.D. ( DuPont Photomasks,Inc. )

Publication title:

17th Annual BACUS Symposium on Photomask Technology and Management

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3236

Pub. Year:

1998

Page(from):

76

Page(to):

81

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819426697 [0819426695]

Language:

English

Call no.:

P63600/3236

Type:

Conference Proceedings