1.

Conference Proceedings
Conference Proceedings
1. Toward DFM: process worthy design and OPC through verification method using MEEF, TF・MEEF, and MTT [6156-21]
Kim, I.-S. ; Suh, S. ; Jung, S. ; Lee, E. ; Kang, Y.-S. ; Lee, S. ; Woo, S.-G. ; Cho, H.
Pub. info.: Design and process integration for microelectronic manufacturing IV : 23-24 February, 2006, San Jose, California, USA.  pp.61560L-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6156
2.

Conference Proceedings
Conference Proceedings
2. First microprocessors with immersion lithography
Lee, D.-Y. ; Kim, I.-S. ; Jung, S.-G. ; Jung, M.-H. ; Park, J.-O. ; Oh, S.-H. ; Woo, S.-G. ; Cho, H.-K. ; Moon, J.-T.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.119-128,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
3.

Conference Proceedings
Conference Proceedings
3. Improving model-based OPC performance for sub-60nm devices using real source optical model [6156-32]
Jung, S. ; Kim, I.-S. ; Kang, Y.-S. ; Yeo, G.-S. ; Woo, S.-G. ; Cho. H. ; Moon, K.-T.
Pub. info.: Design and process integration for microelectronic manufacturing IV : 23-24 February, 2006, San Jose, California, USA.  pp.61561H-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6156
4.

Conference Proceedings
Conference Proceedings
4. Water distribution within immersed polymer films
Kang, Y. ; Hong, J. ; Lee, S.-Y. ; Lee, H.-R. ; Ryoo, M.-H. ; Woo, S.-G. ; Cho, H.-K. ; Moon, J.-T.
Pub. info.: Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA.  pp.31-39,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5753(1)
5.

Conference Proceedings
Conference Proceedings
5. Requirement of in-field illumination control for low k1 imaging below 0.3
Hwang, C. ; Shin, J. ; Lee, S.-J. ; Woo, S.-G. ; Cho, H.-K. ; Moon, J.-T.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.1548-1556,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
6.

Conference Proceedings
Conference Proceedings
6. One small step: world's first integrated EUVL process line
Kim, S.-S. ; Chalyck, R. ; Woo, S.-G. ; Cho, H.-K.
Pub. info.: Emerging lithographic technologies IX : 1-3 March 2005, San Jose, California, USA.  pp.64-77,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5751
7.

Conference Proceedings
Conference Proceedings
7. Advanced module-based approach to effective CD prediction of sub-100nm patterns
Shin, J. ; Kim, I. ; Hwang, C. ; Park, D.-W. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S. ; Moon, J.-T.
Pub. info.: Data analysis and modeling for process control : 26-27 February 2004, Santa Clara, California, USA.  pp.65-73,  2004.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5378
8.

Conference Proceedings
Conference Proceedings
8. Layer-specific illumination optimization by Monte Carlo method
Kim, H.-C. ; Nam, D.-S. ; Hwang, C. ; Kang, Y.S. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.
Pub. info.: Optical Microlithography XVI.  Part One  pp.244-250,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
9.

Conference Proceedings
Conference Proceedings
9. Evaluation of ArF CLM in the sub-100-nm DRAM cell
Lee, J.-H. ; Chung, D.-H. ; Kim, H.-C. ; Nam, D.-S. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.
Pub. info.: Optical Microlithography XVI.  Part One  pp.251-260,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
10.

Conference Proceedings
Conference Proceedings
10. Implementation of the ArF resists based on VEMA for sub-100-nm device
Kim, H.-W. ; Lee, S. ; Choi, S.-J. ; Lee, S.-H. ; Kang, Y. ; Woo, S.-G. ; Nam, D.S. ; Chae, Y.-S. ; Kim, J.S. ; Moon, J.-T. ; Kavanagh, R.J. ; Barclay, G.G.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part One  pp.533-540,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
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Conference Proceedings
Conference Proceedings
11. Flare-induced CD variation correction using transmittance controlled mask
Nam, D.-S. ; Yeo, G.-S. ; Park, J.R. ; Choi, S.-W. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.
Pub. info.: Optical Microlithography XVI.  Part One  pp.561-569,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
12.

Conference Proceedings
Conference Proceedings
12. Process latitude extension in low k1 DRAM lithography using specific layer-oriented illumination design
Kang, Y.S. ; Nam, D.-S. ; Hwang, C. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.
Pub. info.: Optical Microlithography XVI.  Part Three  pp.1304-1309,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
13.

Conference Proceedings
Conference Proceedings
13. Extension of Cr-less PSM to sub 90-nm-node DRAM and logic device
Lee, J.-H. ; Kim, H.-D. ; Chung, D.-H. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.727-735,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
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Conference Proceedings
Conference Proceedings
14. Fluorocarbon-based single-layer resist for 157-nm lithography
Song, K.Y. ; Yoon, K.-S. ; Choi, S.-J. ; Woo, S.-G. ; Han, W.-S. ; Lee, J.-J. ; Lee, S.-K. ; Noh, C.-H. ; Honda, K.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part One  pp.504-511,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
15.

Conference Proceedings
Conference Proceedings
15. Measurement of the flare and in-field linewidth variation due to the flare
Jeong, T.M. ; Choi, S.-W. ; Woo, S.-G. ; Han, W.-S. ; Sohn, J.-M.
Pub. info.: Optical Microlithography XV.  Part Two  pp.1465-1473,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
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Conference Proceedings
Conference Proceedings
16. Way for LEEPL technology to succeed in memory device application
Kim, I.-S. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S. ; Moon, J.-T.
Pub. info.: Emerging Lithographic Technologies VIII.  pp.1060-1067,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5374
17.

Conference Proceedings
Conference Proceedings
17. Successful application of angular scatterometry to process control in sub-100-nm DRAM device
Kim, J.- ; Kim, S.-J. ; Chin, S.-B. ; Oh, S.-H. ; Goo, D.-H. ; Lee, S.-J. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S. ; Moon, J.-T. ; Raymond, C.J. ; Littau, M.E. ; Youn, B.J. ; Sohn, C.-J.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVIII.  pp.541-549,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5375
18.

Conference Proceedings
Conference Proceedings
18. Image simulation in immersion lithography using Debye integral and scattering matrix method
Kim, S.-S. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.
Pub. info.: Optical Microlithography XVII.  pp.393-404,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
19.

Conference Proceedings
Conference Proceedings
19. Evaluation of puddle time effect and optimization of development process in 193-nm lithography
Lee, H.-R. ; Shin, J. ; Kim, H.-W. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.1115-1122,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
20.

Conference Proceedings
Conference Proceedings
20. Performance of a SSQ-type ArF bilayer resist in 80-nm node DRAM line and space fabrication
Jung, M.-H. ; Kim, H.-W. ; Hong, J. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.1100-1106,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
21.

Conference Proceedings
Conference Proceedings
21. Layer-specific illumination for low-k1 periodic and semiperiodic DRAM cell patterns: design procedure and application
Hwang, C. ; Nam, D.-S. ; Park, J.-H. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.
Pub. info.: Optical Microlithography XVII.  pp.947-952,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
22.

Conference Proceedings
Conference Proceedings
22. Investigation of stray light characteristic by multiple Gaussian modeling and its OPC application
Kim, H. ; Nam, D. ; Yeo, G.-S. ; Lee, S.-J. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.
Pub. info.: Optical Microlithography XVII.  pp.459-462,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
23.

Conference Proceedings
Conference Proceedings
23. Impact of illumination intensity profile on lithography simulation
Hwang, C. ; Kim, I. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.
Pub. info.: Optical Microlithography XVII.  pp.1427-1434,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
24.

Conference Proceedings
Conference Proceedings
24. Modified procedure for evaluation of low-k1 process windows
Park, D.-W. ; Lee, S. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.
Pub. info.: Optical Microlithography XVII.  pp.1422-1426,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
25.

Conference Proceedings
Conference Proceedings
25. A simple and accurate resist parameter extraction method for sub-80-nm DRAM patterns
Lee, S. ; Hwang, C. ; Park, D.-W. ; Kim, I.-S. ; Kim, H.-C. ; Woo, S.-G. ; Cho, H.-K. ; Moon, J.-T.
Pub. info.: Optical Microlithography XVII.  pp.1413-1421,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
26.

Conference Proceedings
Conference Proceedings
26. Strategy for sub-80-nm contact hole patterning considering device fabrication
Yoon, J.-Y. ; Hata, M. ; Hah, J.-H. ; Kim, H.-W. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.196-204,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
27.

Conference Proceedings
Conference Proceedings
27. Comprehensive analysis of sources of total CD variation in ArF resist perspective
Kim, H.-W. ; Lee, H.-R. ; Kim, K.-M. ; Lee, S.Y. ; Kim, B.-C. ; Oh, S.-H. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.254-265,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
28.

Conference Proceedings
Conference Proceedings
28. Effect of line-edge roughness (LER) and line-width roughness (LWR) on sub-100-nm device performance
Lee, J.-Y. ; Shin, J. ; Kim, H.-W. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S. ; Moon, J.-T.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.426-433,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
29.

Conference Proceedings
Conference Proceedings
29. Impact of BARC on SEM shrinkage of ArF resist
Lee, S.Y. ; Kim, M. ; Yoon, S. ; Kim, K.-M. ; Kim, J.H. ; Kim, H.-W. ; Woo, S.-G. ; Kim, Y.H. ; Chon, S.-M. ; Kishioka, T. ; Sone, Y. ; Nakajima, Y.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.575-582,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
30.

Conference Proceedings
Conference Proceedings
30. Improvement of pattern collapse in sub-100 nm nodes
Jung, M.-H. ; Lee, S.-H. ; Kim, H.-W. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.
Pub. info.: Advances in Resist Technology and Processing XX.  2  pp.1298-1303,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039
31.

Conference Proceedings
Conference Proceedings
31. Advanced RELACS (resolution enhancment of lithography by assist of chemical shrink) material for 193-nm lithography
Hong, S. ; Takano, Y. ; Kanda, T. ; Kudo, T. ; Padmanaban, M. ; Tanaka, H. ; Lee, S.-H. ; Lee, J.-H. ; Woo, S.-G.
Pub. info.: Advances in Resist Technology and Processing XX.  1  pp.195-206,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039
32.

Conference Proceedings
Conference Proceedings
32. Most feasible curing process for ArF resists in device integration aspect
Kim, H.-W. ; Kang, Y. ; Lee, J.-H. ; Chae, Y.-S. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.
Pub. info.: Advances in Resist Technology and Processing XX.  2  pp.817-826,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039
33.

Conference Proceedings
Conference Proceedings
33. Novel surface silylation process for chemically amplified photoresist
Lee, S.-H. ; Hong, J. ; Woo, S.-G. ; Cho, H.-G. ; Han, W,-S.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part Two  pp.1005-1012,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
34.

Conference Proceedings
Conference Proceedings
34. Comparison of ArF bilayer resists for sub-90 nm L/S fabrication
Hong, J. ; Kim, H.-W. ; Lee, S.-H. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.
Pub. info.: Advances in Resist Technology and Processing XX.  1  pp.249-256,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039