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10 results

Conference Proceedings

1. Implementation of the ArF resists based on VEMA for sub-100-nm device

Kim, H.-W. ; Lee, S. ; Choi, S.-J. ; Lee, S.-H. ; Kang, Y. ; Woo, S.-G. ; Nam, D.S. ; Chae, Y.-S. ; Kim, J.S. ; Moon, J.-T. ; Kavanagh, R.J. ; Barclay, G.G.

Pub. info.:	Advances in Resist Technology and Processing XIX. Part One pp.533-540, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4690

Conference Proceedings

2. Evaluation of puddle time effect and optimization of development process in 193-nm lithography

Lee, H.-R. ; Shin, J. ; Kim, H.-W. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.

Pub. info.:	Advances in Resist Technology and Processing XXI. pp.1115-1122, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5376

Conference Proceedings

3. Performance of a SSQ-type ArF bilayer resist in 80-nm node DRAM line and space fabrication

Jung, M.-H. ; Kim, H.-W. ; Hong, J. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.

Pub. info.:	Advances in Resist Technology and Processing XXI. pp.1100-1106, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5376

Conference Proceedings

4. Strategy for sub-80-nm contact hole patterning considering device fabrication

Yoon, J.-Y. ; Hata, M. ; Hah, J.-H. ; Kim, H.-W. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.

Pub. info.:	Advances in Resist Technology and Processing XXI. pp.196-204, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5376

Conference Proceedings

5. Comprehensive analysis of sources of total CD variation in ArF resist perspective

Kim, H.-W. ; Lee, H.-R. ; Kim, K.-M. ; Lee, S.Y. ; Kim, B.-C. ; Oh, S.-H. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.

Pub. info.:	Advances in Resist Technology and Processing XXI. pp.254-265, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5376

Conference Proceedings

6. Effect of line-edge roughness (LER) and line-width roughness (LWR) on sub-100-nm device performance

Lee, J.-Y. ; Shin, J. ; Kim, H.-W. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S. ; Moon, J.-T.

Pub. info.:	Advances in Resist Technology and Processing XXI. pp.426-433, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5376

Conference Proceedings

7. Impact of BARC on SEM shrinkage of ArF resist

Lee, S.Y. ; Kim, M. ; Yoon, S. ; Kim, K.-M. ; Kim, J.H. ; Kim, H.-W. ; Woo, S.-G. ; Kim, Y.H. ; Chon, S.-M. ; Kishioka, T. ; Sone, Y. ; Nakajima, Y.

Pub. info.:	Advances in Resist Technology and Processing XXI. pp.575-582, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5376

Conference Proceedings

8. Improvement of pattern collapse in sub-100 nm nodes

Jung, M.-H. ; Lee, S.-H. ; Kim, H.-W. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.

Pub. info.:	Advances in Resist Technology and Processing XX. 2 pp.1298-1303, 2003. Bellingham, CA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5039

Conference Proceedings

9. Most feasible curing process for ArF resists in device integration aspect

Kim, H.-W. ; Kang, Y. ; Lee, J.-H. ; Chae, Y.-S. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.

Pub. info.:	Advances in Resist Technology and Processing XX. 2 pp.817-826, 2003. Bellingham, CA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5039

10.

Conference Proceedings

10. Comparison of ArF bilayer resists for sub-90 nm L/S fabrication

Hong, J. ; Kim, H.-W. ; Lee, S.-H. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.

Pub. info.:	Advances in Resist Technology and Processing XX. 1 pp.249-256, 2003. Bellingham, CA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5039

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