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23 results

Conference Proceedings

1. Advanced module-based approach to effective CD prediction of sub-100nm patterns

Shin, J. ; Kim, I. ; Hwang, C. ; Park, D.-W. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S. ; Moon, J.-T.

Pub. info.:	Data analysis and modeling for process control : 26-27 February 2004, Santa Clara, California, USA. pp.65-73, 2004. Bellingham, Wash., USA. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5378

Conference Proceedings

2. Layer-specific illumination optimization by Monte Carlo method

Kim, H.-C. ; Nam, D.-S. ; Hwang, C. ; Kang, Y.S. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.

Pub. info.:	Optical Microlithography XVI. Part One pp.244-250, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5040

Conference Proceedings

3. Evaluation of ArF CLM in the sub-100-nm DRAM cell

Lee, J.-H. ; Chung, D.-H. ; Kim, H.-C. ; Nam, D.-S. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.

Pub. info.:	Optical Microlithography XVI. Part One pp.251-260, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5040

Conference Proceedings

4. Flare-induced CD variation correction using transmittance controlled mask

Nam, D.-S. ; Yeo, G.-S. ; Park, J.R. ; Choi, S.-W. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.

Pub. info.:	Optical Microlithography XVI. Part One pp.561-569, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5040

Conference Proceedings

5. Process latitude extension in low k1 DRAM lithography using specific layer-oriented illumination design

Kang, Y.S. ; Nam, D.-S. ; Hwang, C. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.

Pub. info.:	Optical Microlithography XVI. Part Three pp.1304-1309, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5040

Conference Proceedings

6. Extension of Cr-less PSM to sub 90-nm-node DRAM and logic device

Lee, J.-H. ; Kim, H.-D. ; Chung, D.-H. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology X. pp.727-735, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5130

Conference Proceedings

7. Fluorocarbon-based single-layer resist for 157-nm lithography

Song, K.Y. ; Yoon, K.-S. ; Choi, S.-J. ; Woo, S.-G. ; Han, W.-S. ; Lee, J.-J. ; Lee, S.-K. ; Noh, C.-H. ; Honda, K.

Pub. info.:	Advances in Resist Technology and Processing XIX. Part One pp.504-511, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4690

Conference Proceedings

8. Measurement of the flare and in-field linewidth variation due to the flare

Jeong, T.M. ; Choi, S.-W. ; Woo, S.-G. ; Han, W.-S. ; Sohn, J.-M.

Pub. info.:	Optical Microlithography XV. Part Two pp.1465-1473, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4691

Conference Proceedings

9. Way for LEEPL technology to succeed in memory device application

Kim, I.-S. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S. ; Moon, J.-T.

Pub. info.:	Emerging Lithographic Technologies VIII. pp.1060-1067, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5374

10.

Conference Proceedings

10. Successful application of angular scatterometry to process control in sub-100-nm DRAM device

Kim, J.- ; Kim, S.-J. ; Chin, S.-B. ; Oh, S.-H. ; Goo, D.-H. ; Lee, S.-J. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S. ; Moon, J.-T. ; Raymond, C.J. ; Littau, M.E. ; Youn, B.J. ; Sohn, C.-J.

Pub. info.:	Metrology, Inspection, and Process Control for Microlithography XVIII. pp.541-549, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5375

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