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Alternating phase-shifting mask design for low aberration sensitivity

Author(s):
  • Mak, G.Y. ( Univ. of Hong Kong (Hong Kong China) )
  • Wong, A.K. ( Fortis Systems, Inc. (USA) )
  • Lam, E.Y. ( Univ. of Hong Kong (Hong Kong China) )
Publication title:
Optical Microlithography XVII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5377
Pub. Year:
2004
Page(from):
591
Page(to):
601
Pages:
11
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452900 [0819452904]
Language:
English
Call no.:
P63600/5377.1
Type:
Conference Proceedings

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